The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Mikhail A. Kats sits on this spectrum.
This scientist: 190 publications — 26th percentile
26% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Mikhail A. Kats sits on this spectrum.
This scientist: 46 D-Index — 52nd percentile
52% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
Mikhail A. Kats is affiliated with the University of Wisconsin-Madison in the United States. Their research spans multiple disciplines, focusing primarily on engineering and materials science with significant contributions to physics and astronomy. The scientist's work encompasses several subfields including electrical and electronic engineering, atomic and molecular physics and optics, materials chemistry, civil and structural engineering, and biomedical engineering.
Their research interests include a range of specialized topics such as thermal radiation and cooling technologies, transition metal oxide nanomaterials, cold atom physics and Bose-Einstein condensates, phase-change materials and chalcogenides, calibration and measurement techniques, photonic and optical devices, and 2D materials and applications.
Mikhail A. Kats has published extensively in various scientific venues, with frequent publications appearing in:
The scientist collaborates regularly with colleagues including Chenghao Wan, Yuzhe Xiao, Hongyan Mei, Jad Salman, and Raymond Wambold. These coauthors have appeared in multiple joint publications reflecting an ongoing research partnership.
Representative recent research papers authored or coauthored by Mikhail A. Kats include:
Francesco Aieta;Patrice Genevet;Patrice Genevet;Mikhail A. Kats;Nanfang Yu
Francesco Aieta;Patrice Genevet;Mikhail A. Kats;Nanfang Yu
Nanfang Yu;Francesco Aieta;Francesco Aieta;Patrice Genevet;Patrice Genevet;Mikhail A. Kats
Francesco Aieta;Mikhail A. Kats;Patrice Genevet;Federico Capasso
Francesco Aieta;Mikhail Kats;Patrice Genevet;Federico Capasso
Mikhail A. Kats;Romain Blanchard;Patrice Genevet;Federico Capasso
Yu Yao;Raji Shankar;Mikhail A. Kats;Yi Song
Mikhail A. Kats;Deepika Sharma;Jiao Lin;Patrice Genevet
Yu Yao;Mikhail A. Kats;Patrice Genevet;Nanfang Yu
Francesco Aieta;Patrice Genevet;Patrice Genevet;Nanfang Yu;Mikhail A. Kats
Patrice Genevet;Nanfang Yu;Francesco Aieta;Jiao Lin
Mohammadreza Khorasaninejad;Francesco Aieta;Francesco Aieta;Pritpal Kanhaiya;Pritpal Kanhaiya;Mikhail A. Kats;Mikhail A. Kats
Shanyuan Niu;Graham Joe;Huan Zhao;Yucheng Zhou
Nanfang Yu;P. Genevet;F. Aieta;M. A. Kats
Denis G. Baranov;Yuzhe Xiao;Igor A. Nechepurenko;Alex Krasnok
Zhu Wang;Soongyu Yi;Ang Chen;Ming Zhou
Mikhail A. Kats;Romain Blanchard;Shuyan Zhang;Patrice Genevet
Mikhail A. Kats;Federico Capasso
Nanfang Yu;Qi Jie Wang;Qi Jie Wang;Mikhail A. Kats;Jonathan A. Fan
Patrice Genevet;Jiao Lin;Mikhail A. Kats;Federico Capasso
Jiao Lin;Patrice Genevet;Mikhail A. Kats;Nicholas Antoniou
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