The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Michel Dupuis sits on this spectrum.
This scientist: 288 publications — 60th percentile
60% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,295 publications or more.
The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Michel Dupuis sits on this spectrum.
This scientist: 80 D-Index — 81st percentile
81% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 159 D-Index or more.
Michel Dupuis is affiliated with the University at Buffalo, State University of New York, in the United States. Their research spans multiple intersecting fields including Energy, Materials Science, and Engineering, with a particular focus on Renewable Energy, Sustainability and the Environment, Materials Chemistry, and Electrical and Electronic Engineering. The scientist's work is primarily situated within advanced photocatalysis and materials chemistry, emphasizing the interaction of light with materials to enhance performance in energy conversion and environmental applications.
Key research topics include:
Dupuis has contributed to several peer-reviewed journals, with their frequent publication venues being:
Their recent papers include:
Dupuis frequently collaborates with several researchers, including:
Recognitions awarded to Dupuis include being named a Fellow of the American Association for the Advancement of Science (AAAS) in 2008 and a Fellow of the American Physical Society (APS) in 2007. The APS fellowship citation highlights their significant contributions to developing electronic structure methods and computational codes for simulating molecular properties and reactivity.
Michael W. Schmidt;Kim K. Baldridge;Jerry A. Boatz;Steven T. Elbert
Aaron M. Appel;John E. Bercaw;Andrew B. Bocarsly;Holger Dobbek
Michel Dupuis;John Rys;Harry F. King
Ricky A. Kendall;Edoardo Aprà;David E. Bernholdt;Eric J. Bylaska
Bruce C Garrett;David A Dixon;Donald M Camaioni;Daniel M Chipman
E. Aprà;E. J. Bylaska;W. A. de Jong;N. Govind
E. Aprà;E. J. Bylaska;W. A. de Jong;N. Govind
Graham J. B. Hurst;Michel Dupuis;Enrico Clementi
C. Adant;Michel Dupuis;J. L. Bredas
N. Aaron Deskins;Michel Dupuis
Abbas Farazdel;Michel Dupuis;Enrico Clementi;Ari Aviram
S. P. Karna;M. Dupuis
Nellie I. Iordanova;Michel Dupuis;Kevin M. Rosso
Kevin M. Rosso;Dayle M. A. Smith;Michel Dupuis
K. S. Kim;Michel Dupuis;G. C. Lie;E. Clementi
M. Dupuis;H.F. King
Harry F. King;Michel Dupuis
J. Rys;M. Dupuis;H. F. King
Fiona Sim;Steven Chin;Michel Dupuis;Julia E. Rice
Jingqi Guan;Zhiyao Duan;Fuxiang Zhang;Shelly D. Kelly
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National Institute of Advanced Industrial Science and Technology
Publications: 134
Cercacor (United States)
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