| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Materials Science | 153 | 1465 | 1741 | 44 |
Nanotechnology covers a variety of subjects, including Nanotechnology, Optoelectronics, Chemical engineering, Nanoparticle and Nanowire. Nanotechnology research presented in the journal encompasses a variety of subjects, including Silicon and Electrode. The journal facilitates discussions on Optoelectronics that incorporate concepts from other fields like Thin film and Substrate (electronics).
Topics in Chemical engineering were tackled in line with various other fields like Electrochemistry and Catalysis. Nanoparticle research discussed connects with the study of Analytical chemistry. Raman spectroscopy is a focus of the presented Analytical chemistry works and it dives deep in Raman spectroscopy.
It explores research in Nanowire and the adjacent study of Condensed matter physics. Research in Carbon nanotube tackled falls within the umbrella of Composite material. Research on Graphene addressed in Nanotechnology frequently intersections with the field of Oxide.
The journal publications are mainly concerned with subjects like Nanotechnology, Chemical engineering, Nanoparticle, Optoelectronics and Composite material. Many of the studies tackled in the most cited articles connect Nanotechnology with a similar field of study like Silicon. The published papers deal with Nanoparticle in conjunction with Analytical chemistry and similar fields in Transmission electron microscopy.
The journal investigates areas of study like Chemical engineering, Layer (electronics), Optoelectronics, Nanophotonics and Photonics. Graphene is part of Chemical engineering studies tackled in the journal. While work presented in it provided substantial information on Layer (electronics), it also covered topics in Charge carrier, Energy conversion efficiency, Perovskite (structure), Mesoporous material and Carbon.
Nanoscopic scale, Dipole, Quantum and Nanostructure are some topics wherein Optoelectronics research discussed in the journal have an impact. In Nanotechnology, Nanolithography, Local density of states, Plasmon, Photon and Surface plasmon resonance are investigated in conjunction with one another to address concerns in Nanophotonics research. It explores issues in Photonics which can be linked to other research areas like Purcell effect and Focused ion beam.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Nanotechnology (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Nanotechnology (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2022 edition, 0.00% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 0.00% were posted by at least one author from the top 10 institutions publishing in the journal. Another 0.00% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 14.29% of all publications and 85.71% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Halid Mulaosmanovic;Evelyn T Breyer;Stefan Dünkel;Sven Beyer
(2021)Unknown
(2021)Minjie Hou;Feng Liang;Kunfeng Chen;Yongnian Dai
(2020)Xiuyun Zhao;Vesa-Pekka Lehto
(2021)Karl Berggren;Qiangfei Xia;Konstantin K. Likharev;Dmitri B. Strukov
(2021)Jingwen Tian;Xiangyu Chen;Zhong Lin Wang;Zhong Lin Wang
(2020)Xiaoyu Liu;Jin Yi;Jin Yi;Kai Wu;Yong Jiang
(2020)Yi Teng Huang;Seán R. Kavanagh;Seán R. Kavanagh;David O. Scanlon;Aron Walsh
(2020)Hao Guo;Xin Li;Qiang Zhu;Zhenrong Zhang
(2020)Jacob Scott Lewis;Timothy Perrier;Zahra Barani;Fariborz Kargar
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