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ECS Journal of Solid State Science and Technology
H-index 30

ECS Journal of Solid State Science and Technology

2162-8769

Published by: The Electrochemical Society

https://www.electrochem.org/publications/jss/

Ranking & Metrics

Discipline name Position Best Scientists Publications D-Index
Electronics and Electrical Engineering 183 82 160 19
Physics 215 13 27 8
Materials Science 295 274 427 25
Engineering and Technology 591 53 118 14

Additional Metrics

Number of Best Scientists*: 459
Documents by Best Scientists*: 638
Top 100 Ranked Scientists*: 8
SCIMAGO H-index: 75
SCIMAGO SJR: 0.393
Impact Factor: 2.2

Overview

Top Research Topics at ECS Journal of Solid State Science and Technology?

ECS Journal of Solid State Science and Technology investigates areas of study like Optoelectronics, Nanotechnology, Composite material, Analytical chemistry and Doping. The Optoelectronics works featured in it incorporate elements from Layer (electronics) and Thin film. Chemical-mechanical planarization is a focus of the presented Composite material works and it dives deep in Chemical-mechanical planarization.

Topics in Phosphor explored in it were investigated in conjunction with research in Luminescence and Photoluminescence.

  • Optoelectronics (34.16%)
  • Nanotechnology (12.94%)
  • Composite material (8.56%)

What are the most cited papers published in the journal?

  • A Review on How Lanthanide Impurity Levels Change with Chemistry and Structure of Inorganic Compounds (219 citations)
  • Perspective—Opportunities and Future Directions for Ga2O3 (203 citations)
  • Ferroelectric Hafnium Oxide Based Materials and Devices: Assessment of Current Status and Future Prospects (201 citations)

Research areas of the most cited articles at ECS Journal of Solid State Science and Technology:

The published articles are mainly concerned with subjects like Optoelectronics, Nanotechnology, Phosphor, Inorganic chemistry and Analytical chemistry. The journal papers focus on Optoelectronics but the discussions also offer insight into other areas such as Amorphous solid, Transistor and Nitride. The works on Phosphor tackled in the most cited publications bring together disciplines like Luminescence and Photoluminescence.

Papers citation over time

A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

The top authors publishing in ECS Journal of Solid State Science and Technology (based on the number of publications) are:

  • Fan Ren (53 papers) published 3 papers at the last edition, 6 less than at the previous edition,
  • Stephen J. Pearton (40 papers) published 2 papers at the last edition, 5 less than at the previous edition,
  • Yasa Sampurno (40 papers) published 2 papers at the last edition, 2 less than at the previous edition,
  • Ara Philipossian (39 papers) published 2 papers at the last edition, 2 less than at the previous edition,
  • Chenwei Wang (31 papers) published 2 papers at the last edition, 2 less than at the previous edition.

The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.

Only papers with recognized affiliations are considered

The top affiliations publishing in ECS Journal of Solid State Science and Technology (based on the number of publications) are:

  • Katholieke Universiteit Leuven (88 papers) published 1 paper at the last edition, 3 less than at the previous edition,
  • Chinese Academy of Sciences (81 papers) published 6 papers at the last edition, 4 less than at the previous edition,
  • National Cheng Kung University (80 papers) published 8 papers at the last edition, 4 more than at the previous edition,
  • National Chiao Tung University (69 papers) published 6 papers at the last edition, 2 less than at the previous edition,
  • University of Florida (66 papers) published 4 papers at the last edition, 7 less than at the previous edition.

The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2021 edition, 49.80% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 17.89% were posted by at least one author from the top 10 institutions publishing in the journal. Another 6.91% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 12.20% of all publications and 63.01% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

  • Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
  • Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
  • Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
  • Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
  • Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.

Top Publications

  • Review—Influence of Processing Parameters to Control Morphology and Optical Properties of Sol-Gel Synthesized ZnO Nanoparticles

    Sandeep Arya;Prerna Mahajan;Sarika Mahajan;Ajit Khosla

    (2021)
    244 Citations
  • Review—Mn4+-Activated Red and Deep Red-Emitting Phosphors

    Sadao Adachi

    (2020)
    188 Citations
  • Review—Progress in High Performance III-Nitride Micro-Light-Emitting Diodes

    Matthew S. Wong;Shuji Nakamura;Steven P. DenBaars

    (2020)
    164 Citations
  • Review—Photoluminescence Properties of Cr3+-Activated Oxide Phosphors

    (2021)
    138 Citations
  • Review—Radiation Damage in Wide and Ultra-Wide Bandgap Semiconductors

    S. J. Pearton;Assel Aitkaliyeva;Minghan Xian;Fan Ren

    (2021)
    118 Citations
  • Review—Silicene: From Material to Device Applications

    Mubashir A. Kharadi;Gul Faroz A. Malik;Farooq A. Khanday;Khurshed A. Shah

    (2020)
    113 Citations
  • Review—The Physics of Recombinations in III-Nitride Emitters

    Aurelien David;Nathan G. Young;Cory Lund;Michael D. Craven

    (2020)
    97 Citations

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Best Scientists Contributing to This Journal