The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Roland Ryf sits on this spectrum.
This scientist: 398 publications — 74th percentile
74% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Roland Ryf sits on this spectrum.
This scientist: 58 D-Index — 74th percentile
74% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
Roland Ryf is affiliated with Nokia in the United States and has an extensive background in engineering research, particularly within the domain of electrical and electronic engineering. Their work encompasses a variety of subfields including atomic and molecular physics, optics, biomedical engineering, artificial intelligence, and general health professions.
The scientist's research topics cover a broad range of advanced optical and photonic technologies. Key areas include:
Roland Ryf's publication record includes notable recent papers such as:
Frequent co-authors collaborating with Roland Ryf include:
The scientist regularly publishes in journals and venues such as:
Among their recognitions, Roland Ryf was named an IEEE Fellow in 2019 for contributions to optical switching and multiplexing technology. They were also inducted as an OSA Fellow in 2015, with citations related to work on optical switching and multiplexing including MEMS, liquid-crystal-on-silicon subsystems, and spatially multiplexed transmission systems.
R. Ryf;S. Randel;A. H. Gnauck;C. Bolle
Sebastian Randel;Roland Ryf;Alberto Sierra;Peter J. Winzer
Nicolas K. Fontaine;Roland Ryf;Haoshuo Chen;David T. Neilson
Sergio G. Leon-Saval;Nicolas K. Fontaine;Joel R. Salazar-Gil;Burcu Ercan
R. Ryf;S. Randel;A. H. Gnauck;C. Bolle
T. Morioka;Y. Awaji;R. Ryf;P. Winzer
Nicolas K. Fontaine;Roland Ryf;Haoshuo Chen;Amado Velazquez Benitez
J. Kim;C.J. Nuzman;B. Kumar;D.F. Lieuwen
Nicolas K. Fontaine;Roland Ryf;Joss Bland-Hawthorn;Sergio G. Leon-Saval
R. Ryf;S. Randel;N. K. Fontaine;M. Montoliu
R. Essiambre;M. A. Mestre;R. Ryf;A. H. Gnauck
R. Ryf;R.-J. Essiambre;A. H. Gnauck;S. Randel
S. Randel;R. Ryf;A. H. Gnauck;M. A. Mestre
Bin Huang;Nicolas K. Fontaine;Roland Ryf;Binbin Guan
V.A. Aksyuk;F. Pardo;D. Carr;D. Greywall
Georg Rademacher;Benjamin J. Puttnam;Ruben S. Luís;Tobias A. Eriksson
J. Leuthold;D.M. Marom;S. Cabot;J.J. Jaques
R. Ryf;J. Kim;J.P. Hickey;A. Gnauck
C. Dorrer;C.R. Doerr;I. Kang;R. Ryf
R.-J Essiambre;R. Ryf;N. K. Fontaine;S. Randel
Yuzhe Xiao;René-Jean Essiambre;Marc Desgroseilliers;Antonia M. Tulino
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