World's Best Scientists 2026 revealed!

D-Index & Metrics

Chemistry

D-Index
70
Citations
16224
World Ranking
5909
National Ranking
337

Richard J. Nichols publication distribution in Chemistry in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Richard J. Nichols sits on this spectrum.

61–80 publications: 66 scientists 81–100 publications: 302 scientists 101–120 publications: 623 scientists 121–140 publications: 918 scientists 141–160 publications: 1,218 scientists 161–180 publications: 1,350 scientists 181–200 publications: 1,344 scientists 201–220 publications: 1,281 scientists 221–240 publications: 1,216 scientists 241–260 publications: 1,100 scientists 261–280 publications: 979 scientists 281–300 publications: 939 scientists 301–320 publications: 764 scientists 321–340 publications: 643 scientists 341–360 publications: 628 scientists 361–380 publications: 522 scientists 381–400 publications: 459 scientists 401–420 publications: 397 scientists 421–440 publications: 327 scientists 441–460 publications: 270 scientists 461–480 publications: 265 scientists 481–500 publications: 252 scientists 501–520 publications: 201 scientists 521–540 publications: 185 scientists 541–560 publications: 148 scientists 561–580 publications: 148 scientists 581–600 publications: 132 scientists 601–620 publications: 114 scientists 621–640 publications: 104 scientists 641–660 publications: 91 scientists 661–680 publications: 92 scientists 681–700 publications: 73 scientists 701–720 publications: 57 scientists 721–740 publications: 54 scientists 741–760 publications: 67 scientists 761–780 publications: 45 scientists 781–800 publications: 46 scientists 801–820 publications: 39 scientists 821–840 publications: 32 scientists 841–860 publications: 36 scientists 861–880 publications: 29 scientists 881–900 publications: 26 scientists 901–920 publications: 24 scientists 921–940 publications: 14 scientists 941–960 publications: 23 scientists 961–980 publications: 28 scientists 981–1,000 publications: 15 scientists 1,001–1,020 publications: 29 scientists 1,021–1,040 publications: 12 scientists 1,041–1,060 publications: 19 scientists 1,061–1,080 publications: 12 scientists 1,081–1,100 publications: 6 scientists 1,101–1,120 publications: 8 scientists 1,121–1,140 publications: 12 scientists 1,141–1,160 publications: 5 scientists 1,161–1,180 publications: 6 scientists 1,181–1,200 publications: 14 scientists 1,201–1,220 publications: 7 scientists 1,221–1,240 publications: 2 scientists 1,241–1,260 publications: 6 scientists 1,261–1,280 publications: 4 scientists 1,281–1,294 publications: 6 scientists 1,295+ publications: 100 scientists
61 publications 1,295+

This scientist: 291 publications — 61st percentile

61% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,295 publications or more.

Richard J. Nichols D-index placement in Chemistry in 2026

The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Richard J. Nichols sits on this spectrum.

40–41 D-Index: 289 scientists 42–43 D-Index: 612 scientists 44–45 D-Index: 808 scientists 46–47 D-Index: 776 scientists 48–49 D-Index: 835 scientists 50–51 D-Index: 861 scientists 52–53 D-Index: 872 scientists 54–55 D-Index: 933 scientists 56–57 D-Index: 1,051 scientists 58–59 D-Index: 930 scientists 60–61 D-Index: 882 scientists 62–63 D-Index: 834 scientists 64–65 D-Index: 731 scientists 66–67 D-Index: 775 scientists 68–69 D-Index: 683 scientists 70–71 D-Index: 646 scientists 72–73 D-Index: 561 scientists 74–75 D-Index: 501 scientists 76–77 D-Index: 437 scientists 78–79 D-Index: 388 scientists 80–81 D-Index: 354 scientists 82–83 D-Index: 292 scientists 84–85 D-Index: 275 scientists 86–87 D-Index: 254 scientists 88–89 D-Index: 235 scientists 90–91 D-Index: 185 scientists 92–93 D-Index: 192 scientists 94–95 D-Index: 155 scientists 96–97 D-Index: 163 scientists 98–99 D-Index: 125 scientists 100–101 D-Index: 105 scientists 102–103 D-Index: 105 scientists 104–105 D-Index: 112 scientists 106–107 D-Index: 88 scientists 108–109 D-Index: 68 scientists 110–111 D-Index: 69 scientists 112–113 D-Index: 65 scientists 114–115 D-Index: 79 scientists 116–117 D-Index: 61 scientists 118–119 D-Index: 44 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 40 scientists 124–125 D-Index: 33 scientists 126–127 D-Index: 26 scientists 128–129 D-Index: 34 scientists 130–131 D-Index: 35 scientists 132–133 D-Index: 25 scientists 134–135 D-Index: 27 scientists 136–137 D-Index: 17 scientists 138–139 D-Index: 16 scientists 140–141 D-Index: 20 scientists 142–143 D-Index: 20 scientists 144–145 D-Index: 15 scientists 146–147 D-Index: 9 scientists 148–149 D-Index: 9 scientists 150–151 D-Index: 16 scientists 152–153 D-Index: 11 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 3 scientists 158 D-Index: 3 scientists 159+ D-Index: 98 scientists
40 D-Index 159+

This scientist: 70 D-Index — 68th percentile

68% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 159 D-Index or more.

Overview

Richard J. Nichols is affiliated with the University of Liverpool in the United Kingdom. Their research primarily spans the fields of Materials Science and Engineering, with significant contributions to the subfields of Materials Chemistry, Electrical and Electronic Engineering, Atomic and Molecular Physics and Optics, Biomedical Engineering, and Electrochemistry. The core topics of their work include Molecular Junctions and Nanostructures, Crystallization and Solubility Studies, X-ray Diffraction in Crystallography, Quantum and Electron Transport Phenomena, Force Microscopy Techniques and Applications, Electrochemical Analysis and Applications, and Organic Electronics and Photovoltaics.

The scientist has published extensively in several prominent venues. Frequent publication venues include:

  • The Cambridge Structural Database
  • Angewandte Chemie International Edition
  • Angewandte Chemie
  • The Journal of Physical Chemistry C
  • University of Liverpool

Recent papers by Richard J. Nichols illustrate their focus on molecular-scale electronics and single-molecule junctions. These works include:

  • Folding a Single-Molecule Junction, 2020, Nano Letters
  • A Chemically Soldered Polyoxometalate Single-Molecule Transistor, 2020, Angewandte Chemie International Edition
  • A Peierls Transition in Long Polymethine Molecular Wires: Evolution of Molecular Geometry and Single-Molecule Conductance, 2021, Journal of the American Chemical Society
  • Molecular Structure-(Thermo)electric Property Relationships in Single-Molecule Junctions and Comparisons with Single- and Multiple-Parameter Models, 2021, Journal of the American Chemical Society
  • Redox-Addressable Single-Molecule Junctions Incorporating a Persistent Organic Radical, 2022, Angewandte Chemie International Edition

Collaborations have been a significant aspect of their work, with frequent co-authors including Andrea Vezzoli, Simon J. Higgins, David C. Milán, Sara Sangtarash, and Colin J. Lambert.

Best Publications

  • A nanometre-scale electronic switch consisting of a metal cluster and redox-addressable groups

    David I. Gittins;Donald Bethell;David J. Schiffrin;Richard J. Nichols

  • Rational and Combinatorial Design of Peptide Capping Ligands for Gold Nanoparticles

    Lévy R;Thanh Nt;Doty Rc;Hussain I

  • Atomic structure of Cu adlayers on Au(100) and Au(111) electrodes observed by in situ scanning tunneling microscopy.

    O.M. Magnussen;J. Hotlos;R. J. Nichols;Dieter M. Kolb

  • Redox state dependence of single molecule conductivity

    Wolfgang Haiss;Harm van Zalinge;Simon J Higgins;Donald Bethell

  • Measurement of single molecule conductivity using the spontaneous formation of molecular wires

    Wolfgang Haiss;Richard J. Nichols;Harm van Zalinge;Simon J. Higgins

  • Surface redox catalysis for O2 reduction on quinone-modified glassy carbon electrodes

    Kaido Tammeveski;Kyösti Kontturi;Richard J Nichols;Robert J Potter

  • Long-range electron tunnelling in oligo-porphyrin molecular wires

    Gita Sedghi;Víctor M. García-Suárez;Víctor M. García-Suárez;Louisa J. Esdaile;Harry L. Anderson

  • Precision control of single-molecule electrical junctions.

    Wolfgang Haiss;Changsheng Wang;Iain Grace;Andrei S. Batsanov

  • In situ studies of the oxidation of nickel electrodes in alkaline solution

    S.L. Medway;C.A. Lucas;A. Kowal;R.J. Nichols

  • Single molecule conductance of porphyrin wires with ultralow attenuation.

    Gita Sedghi;Katsutoshi Sawada;Louisa J. Esdaile;Markus Hoffmann

  • Oligoyne Single Molecule Wires

    Changsheng Wang;Andrei S. Batsanov;Martin R. Bryce;Santiago Martin

  • Spectroscopic identification of the adsorbed intermediate in hydrogen evolution on platinum

    R.J. Nichols;A. Bewick

  • The experimental determination of the conductance of single molecules.

    Richard J. Nichols;Wolfgang Haiss;Simon J. Higgins;Edmund Leary;Edmund Leary

  • Impact of Junction Formation Method and Surface Roughness on Single Molecule Conductance

    Wolfgang Haiss;Santiago Martín;Edmund Leary;Harm van Zalinge

  • An approach to long-range electron transfer mechanisms in metalloproteins: In situ scanning tunneling microscopy with submolecular resolution

    Esben P. Friis;Jens E. T. Andersen;Yu. I. Kharkats;A. M. Kuznetsov

  • Linear correlation between surface stress and surface charge in anion adsorption on Au(111)

    Wolfgang Haiss;Richard J. Nichols;Jürgen K. Sass;Klaus P. Charle

  • Effective Insulation of Scanning Tunneling Microscopy Tips for Electrochemical Studies Using an Electropainting Method

    Claudia E. Bach;Richard J. Nichols;Wolfgang Beckmann;Heinrich Meyer

  • STM observations of the initial stages of copper deposition on gold single-crystal electrodes

    R.J. Nichols;D.M. Kolb;R.J. Behm

  • Diode-like electron transfer across nanostructured films containing a redox ligand

    David I. Gittins;Donald Bethell;Richard J. Nichols;David J. Schiffrin

  • Identifying Diversity in Nanoscale Electrical Break Junctions

    Santiago Martín;Iain Grace;Martin R. Bryce;Changsheng Wang

Frequent Co-Authors

Simon J. Higgins
Simon J. Higgins University of Liverpool
Colin J. Lambert
Colin J. Lambert Lancaster University
Paul J. Low
Paul J. Low University of Western Australia
David J. Schiffrin
David J. Schiffrin University of Liverpool
Donald Bethell
Donald Bethell University of Liverpool
Nicolás Agraït
Nicolás Agraït Autonomous University of Madrid
Thomas P. Monath
Thomas P. Monath Crozet BioPharma
Harry L. Anderson
Harry L. Anderson University of Oxford
Jens Ulstrup
Jens Ulstrup Technical University of Denmark
David G. Fernig
David G. Fernig University of Liverpool

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