World's Best Scientists 2026 revealed!
Juarez L. F. Da Silva

Juarez L. F. Da Silva

D-Index & Metrics

Chemistry

D-Index
52
Citations
11313
World Ranking
13421
National Ranking
103

Juarez L. F. Da Silva publication distribution in Chemistry in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Juarez L. F. Da Silva sits on this spectrum.

61–80 publications: 66 scientists 81–100 publications: 302 scientists 101–120 publications: 623 scientists 121–140 publications: 918 scientists 141–160 publications: 1,218 scientists 161–180 publications: 1,350 scientists 181–200 publications: 1,344 scientists 201–220 publications: 1,281 scientists 221–240 publications: 1,216 scientists 241–260 publications: 1,100 scientists 261–280 publications: 979 scientists 281–300 publications: 939 scientists 301–320 publications: 764 scientists 321–340 publications: 643 scientists 341–360 publications: 628 scientists 361–380 publications: 522 scientists 381–400 publications: 459 scientists 401–420 publications: 397 scientists 421–440 publications: 327 scientists 441–460 publications: 270 scientists 461–480 publications: 265 scientists 481–500 publications: 252 scientists 501–520 publications: 201 scientists 521–540 publications: 185 scientists 541–560 publications: 148 scientists 561–580 publications: 148 scientists 581–600 publications: 132 scientists 601–620 publications: 114 scientists 621–640 publications: 104 scientists 641–660 publications: 91 scientists 661–680 publications: 92 scientists 681–700 publications: 73 scientists 701–720 publications: 57 scientists 721–740 publications: 54 scientists 741–760 publications: 67 scientists 761–780 publications: 45 scientists 781–800 publications: 46 scientists 801–820 publications: 39 scientists 821–840 publications: 32 scientists 841–860 publications: 36 scientists 861–880 publications: 29 scientists 881–900 publications: 26 scientists 901–920 publications: 24 scientists 921–940 publications: 14 scientists 941–960 publications: 23 scientists 961–980 publications: 28 scientists 981–1,000 publications: 15 scientists 1,001–1,020 publications: 29 scientists 1,021–1,040 publications: 12 scientists 1,041–1,060 publications: 19 scientists 1,061–1,080 publications: 12 scientists 1,081–1,100 publications: 6 scientists 1,101–1,120 publications: 8 scientists 1,121–1,140 publications: 12 scientists 1,141–1,160 publications: 5 scientists 1,161–1,180 publications: 6 scientists 1,181–1,200 publications: 14 scientists 1,201–1,220 publications: 7 scientists 1,221–1,240 publications: 2 scientists 1,241–1,260 publications: 6 scientists 1,261–1,280 publications: 4 scientists 1,281–1,294 publications: 6 scientists 1,295+ publications: 100 scientists
61 publications 1,295+

This scientist: 258 publications — 52nd percentile

52% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,295 publications or more.

Juarez L. F. Da Silva D-index placement in Chemistry in 2026

The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Juarez L. F. Da Silva sits on this spectrum.

40–41 D-Index: 289 scientists 42–43 D-Index: 612 scientists 44–45 D-Index: 808 scientists 46–47 D-Index: 776 scientists 48–49 D-Index: 835 scientists 50–51 D-Index: 861 scientists 52–53 D-Index: 872 scientists 54–55 D-Index: 933 scientists 56–57 D-Index: 1,051 scientists 58–59 D-Index: 930 scientists 60–61 D-Index: 882 scientists 62–63 D-Index: 834 scientists 64–65 D-Index: 731 scientists 66–67 D-Index: 775 scientists 68–69 D-Index: 683 scientists 70–71 D-Index: 646 scientists 72–73 D-Index: 561 scientists 74–75 D-Index: 501 scientists 76–77 D-Index: 437 scientists 78–79 D-Index: 388 scientists 80–81 D-Index: 354 scientists 82–83 D-Index: 292 scientists 84–85 D-Index: 275 scientists 86–87 D-Index: 254 scientists 88–89 D-Index: 235 scientists 90–91 D-Index: 185 scientists 92–93 D-Index: 192 scientists 94–95 D-Index: 155 scientists 96–97 D-Index: 163 scientists 98–99 D-Index: 125 scientists 100–101 D-Index: 105 scientists 102–103 D-Index: 105 scientists 104–105 D-Index: 112 scientists 106–107 D-Index: 88 scientists 108–109 D-Index: 68 scientists 110–111 D-Index: 69 scientists 112–113 D-Index: 65 scientists 114–115 D-Index: 79 scientists 116–117 D-Index: 61 scientists 118–119 D-Index: 44 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 40 scientists 124–125 D-Index: 33 scientists 126–127 D-Index: 26 scientists 128–129 D-Index: 34 scientists 130–131 D-Index: 35 scientists 132–133 D-Index: 25 scientists 134–135 D-Index: 27 scientists 136–137 D-Index: 17 scientists 138–139 D-Index: 16 scientists 140–141 D-Index: 20 scientists 142–143 D-Index: 20 scientists 144–145 D-Index: 15 scientists 146–147 D-Index: 9 scientists 148–149 D-Index: 9 scientists 150–151 D-Index: 16 scientists 152–153 D-Index: 11 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 3 scientists 158 D-Index: 3 scientists 159+ D-Index: 98 scientists
40 D-Index 159+

This scientist: 52 D-Index — 26th percentile

26% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 159 D-Index or more.

Overview

Juarez L. F. Da Silva is affiliated with the Universidade de São Paulo in Brazil. Their research primarily spans the fields of Materials Science and Engineering, with a significant focus on Materials Chemistry and Electrical and Electronic Engineering as key subfields.

The scientist's work covers a variety of specialized topics, including:

  • Catalytic Processes in Materials Science
  • 2D Materials and Applications
  • Perovskite Materials and Applications
  • Catalysis and Oxidation Reactions
  • Ionic liquids properties and applications
  • Machine Learning in Materials Science
  • CO2 Reduction Techniques and Catalysts

Their publication record includes works in these common venues:

  • Physical Chemistry Chemical Physics
  • The Journal of Physical Chemistry C
  • Journal of Chemical Information and Modeling
  • ACS Applied Energy Materials
  • ACS Omega

Frequent collaborators with multiple joint publications include:

  • Matheus P. Lima
  • Tuanan C. Lourenço
  • Marcos G. Quiles
  • Lucas G. Verga
  • Luís Gustavo Dias

Key recent papers authored by or involving Juarez L. F. Da Silva include:

  • "Machine Learning Prediction of Nine Molecular Properties Based on the SMILES Representation of the QM9 Quantum-Chemistry Dataset" (2020, The Journal of Physical Chemistry A)
  • "Insights into the alloy-support synergistic effects for the CO2 hydrogenation towards methanol on oxide-supported Ni5Ga3 catalysts: An experimental and DFT study" (2021, Applied Catalysis B: Environmental)
  • "Role of Structural Phases and Octahedra Distortions in the Optoelectronic and Excitonic Properties of CsGeX3 (X = Cl, Br, I) Perovskites" (2021, The Journal of Physical Chemistry C)
  • "Excitonic Effects on Two-Dimensional Transition-Metal Dichalcogenide Monolayers: Impact on Solar Cell Efficiency" (2021, ACS Applied Energy Materials)
  • "Theoretical Investigation of the Na+ Transport Mechanism and the Performance of Ionic Liquid-Based Electrolytes in Sodium-Ion Batteries" (2021, ACS Applied Energy Materials)

Best Publications

  • Nature of the Band Gap of In2O3 Revealed by First-Principles Calculations and X-Ray Spectroscopy

    Aron Walsh;Juarez L.F. Da Silva;Su Huai Wei;C. Körber

  • Hybrid functionals applied to rare-earth oxides: The example of ceria

    Juarez L. F. Da Silva;M. Verónica Ganduglia-Pirovano;Joachim Sauer;Veronika Bayer

  • Density-functional calculations of the structure of near-surface oxygen vacancies and electron localization on CeO2(111).

    M. Verónica Ganduglia-Pirovano;Juarez L. F. Da Silva;Juarez L. F. Da Silva;Joachim Sauer

  • Origins of band-gap renormalization in degenerately doped semiconductors

    Aron Walsh;Juarez L.F. Da Silva;Su Huai Wei

  • Converged properties of clean metal surfaces by all-electron first-principles calculations

    Juarez L. F. Da Silva;Catherine Stampfl;Matthias Scheffler

  • Theoretical description of carrier mediated magnetism in cobalt doped ZnO.

    Aron Walsh;Juarez L.F. Da Silva;Su Huai Wei

  • Density functional theory investigation of 3d, 4d, and 5d 13-atom metal clusters

    Unknown

  • Revised ab initio natural band offsets of all group IV, II-VI, and III-V semiconductors

    Yong Hua Li;Aron Walsh;Shiyou Chen;Wan Jian Yin

  • Spin-Orbit Coupling and Ion Displacements in Multiferroic TbMnO3

    H. J. Xiang;Su-Huai Wei;M.-H. Whangbo;Juarez L. F. Da Silva

  • Adsorption of Xe atoms on metal surfaces: New insights from first-principles calculations

    Juarez Lopes Ferreira Da Silva;Catherine Stampfl;Matthias Scheffler

  • Evolution of the structural, energetic, and electronic properties of the 3d, 4d, and 5d transition-metal clusters (30 TMn systems for n = 2-15): a density functional theory investigation

    Anderson S. Chaves;Maurício J. Piotrowski;Juarez L. F. Da Silva

  • Insights into the structure of the stable and metastable ( GeTe ) m ( Sb 2 Te 3 ) n compounds

    Juarez L. F. Da Silva;Aron Walsh;Hosun Lee

  • Cohesive properties of group-III nitrides: A comparative study of all-electron and pseudopotential calculations using the generalized gradient approximation

    M. Fuchs;J. L. F. Da Silva;C. Stampfl;J. Neugebauer

  • Electronic structure of In 2 O 3 and Sn-doped In 2 O 3 by hard x-ray photoemission spectroscopy

    C. Körber;V. Krishnakumar;Andreas Klein;G. Panaccione

  • Optical properties of pseudobinary GeTe, Ge 2 Sb 2 Te 5 , GeSb 2 Te 4 , GeSb 4 Te 7 , and Sb 2 Te 3 from ellipsometry and density functional theory

    Jun-Woo Park;Seung Hwan Eom;Hosun Lee;Juarez L. F. Da Silva

  • Ethanol and Water Adsorption on Close-Packed 3d, 4d, and 5d Transition-Metal Surfaces: A Density Functional Theory Investigation with van der Waals Correction

    Polina Tereshchuk;Juarez Lopes Ferreira da Silva

  • Effect of copassivation of Cl and Cu on CdTe grain boundaries

    Lixin Zhang;Juarez L.F. Da Silva;Jingbo Li;Yanfa Yan

  • Effect of copassivation of Cl and Cu on CdTe grain boundaries.

    Lixin Zhang;Juarez L. F. Da Silva;Jingbo Li;Yanfa Yan

  • The Role of Charge States in the Atomic Structure of Cun and Ptn (n = 2–14 atoms) Clusters: A DFT Investigation

    Anderson Silva Chaves;Gustavo Garcia Rondina;Maurício Jeomar Piotrowski;Polina Tereshchuk

  • Effective coordination concept applied for phase change (GeTe)m(Sb2Te3)n compounds

    Juarez L. F. Da Silva

  • Interplay between order and disorder in the high performance of amorphous transparent conducting oxides

    Aron Walsh;Juarez L.F. Da Silva;Su Huai Wei

  • Insights into the structure of the stable and meta-stable (GeTe)$_m$(Sb$_2$Te$_3$)$_n$ compounds

    Juarez L.F. Da Silva;Aron Walsh;Hosun Lee

Frequent Co-Authors

Su-Huai Wei
Su-Huai Wei Eastern Institute of Technology, Ningbo
Aron Walsh
Aron Walsh Imperial College London
Catherine Stampfl
Catherine Stampfl University of Sydney
Yanfa Yan
Yanfa Yan University of Toledo
Roland A. Fischer
Roland A. Fischer Technical University of Munich
Matthias Scheffler
Matthias Scheffler Fritz Haber Institute of the Max Planck Society
Stefan Blügel
Stefan Blügel Forschungszentrum Jülich
Joachim Sauer
Joachim Sauer Humboldt-Universität zu Berlin
Christian Gemel
Christian Gemel Technical University of Munich
Samia Kahlal
Samia Kahlal University of Rennes

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