Johan Hofkens is affiliated with KU Leuven in Belgium and has contributed extensively to the fields of Engineering and Materials Science. Their research output spans a variety of subfields, notably Materials Chemistry, Electrical and Electronic Engineering, Molecular Biology, Biomedical Engineering, and Renewable Energy, Sustainability and the Environment.
The scientist's work covers several key topics, including:
Johan Hofkens has collaborated frequently with several co-authors, including:
The scientist has published in multiple research venues with a focus on materials and physical chemistry. Frequent publication venues include:
Among recent papers authored or co-authored by Johan Hofkens are:
In recognition of contributions to science, Johan Hofkens was named Member of the European Academy of Sciences in 2017 and elected Member of Academia Europaea in 2019.
Amrita Dey;Junzhi Ye;Apurba De;Elke Debroye
Yansong Zhou;Yansong Zhou;Fanglin Che;Min Liu;Min Liu;Chengqin Zou
Tanja Weil;Tom Vosch;Johan Hofkens;Kalina Peneva
Katrien G. M. Laurier;Frederik Vermoortele;Rob Ameloot;Dirk E. De Vos
Julian A. Steele;Handong Jin;Iurii Dovgaliuk;Robert F. Berger
Masoumeh Keshavarz;Elke Debroye;Martin Ottesen;Cristina Martin;Cristina Martin
Satoshi Habuchi;Ryoko Ando;Peter Dedecker;Wendy Verheijen
Haowei Huang;Bapi Pradhan;Johan Hofkens;Maarten B. J. Roeffaers
Handong Jin;Elke Debroye;Masoumeh Keshavarz;Ivan G. Scheblykin
Noël Boens;Wenwu Qin;Nikola Basarić;Johan Hofkens
Maarten B. J. Roeffaers;Bert F. Sels;Hiroshi Uji-i;Frans C. De Schryver
Yicheng Zhao;Yicheng Zhao;Hairen Tan;Haifeng Yuan;Haifeng Yuan;Zhenyu Yang
Amirhasan Nourbakhsh;Mirco Cantoro;Tom Vosch;Geoffrey Pourtois
Ophir Flomenbom;Kelly Velonia;Davey Loos;Sadahiro Masuo
Markus Sauer;Johan Hofkens;Jörg Enderlein
Wouter Sempels;Raf De Dier;Hideaki Mizuno;Johan Hofkens
F. C. De Schryver;T. Vosch;M. Cotlet;M. Van der Auweraer
M Maus;M Cotlet;J Hofkens;T Gensch
Haifeng Yuan;Elke Debroye;Kris P F Janssen;Hiroyuki Naiki
Johan Hofkens;Michael Maus;Thomas Gensch;Tom Vosch
Katrien G. M. Laurier;Frederik Vermoortele;Rob Ameloot;Dirk E. De Vos
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