| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Materials Science | 361 | 73 | 169 | 20 |
| Chemistry | 444 | 50 | 104 | 18 |
Plasma Processes and Polymers focuses largely on the fields of Analytical chemistry, Chemical engineering, Thin film, Composite material and Polymer. It facilitates discussions on Analytical chemistry that incorporate concepts from other fields like Plasma-enhanced chemical vapor deposition, Dielectric barrier discharge and Atmospheric-pressure plasma. The journal explores studies in Dielectric barrier discharge as part of the wider topic of Dielectric.
In addition to Chemical engineering research, it aims to explore topics under Plasma polymerization, Scientific method and Polymer chemistry. The journal focused on Plasma polymerization research conducted under the discipline of Polymerization. The in-depth study on Thin film also explores topics in the intersecting field of Deposition (phase transition).
Coating and Adhesion are all areas of Composite material tackled in it. X-ray photoelectron spectroscopy research presented in it encompasses a variety of subjects, including Fourier transform infrared spectroscopy and Contact angle. Research on Sputter deposition addressed in the journal frequently intersections with the field of Cavity magnetron.
Analytical chemistry, Chemical engineering, Atmospheric-pressure plasma, Dielectric barrier discharge and Polymer chemistry are the main subjects of interest in the most cited papers. The study of Analytical chemistry in the journal publications encompasses disciplines such as Thin film, as well as fields such as Hexamethyldisiloxane, all of which overlap with one another. Coating and Polymer are some topics wherein Chemical engineering research discussed in the most cited publications has an impact.
The journal is organized to address concerns in the fields of Chemical engineering, Atmospheric-pressure plasma, Mechanical engineering, Nonthermal plasma and Dielectric barrier discharge. While the journal focused on Chemical engineering, it was also able to explore topics like Plasma polymerization, Polymerization, Plasma deposition and Chemical vapor deposition. The study of Polymer serves as the foundation of the Plasma polymerization research discussed in it.
Plasma Processes and Polymers tackles issues in Mechanical engineering, particularly in the topics of Front cover and Cover (algebra).
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Plasma Processes and Polymers (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Plasma Processes and Polymers (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 2.92% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 21.80% were posted by at least one author from the top 10 institutions publishing in the journal. Another 21.05% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 25.56% of all publications and 31.58% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Dawei Liu;Yanzhe Zhang;Maoyuan Xu;Hongxiang Chen
(2020)P. S. Ganesh Subramanian;Aditi Jain;Anand M. Shivapuji;Nagalingam R. Sundaresan
(2020)Dirk Hegemann;Ezgi Bülbül;Barbara Hanselmann;Urs Schütz
(2021)Dawei Liu;Endre J Szili;Kostya Ken Ostrikov;Kostya Ken Ostrikov
(2020)Ricardo Molina;Alba Lalueza;Carmen López‐Santos;Carmen López‐Santos;Rouba Ghobeira
(2021)Yao-wei Huang;Qiong-fen Yu;Ming Li;Sheng-nan Sun
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