1359-0294
Published by: Elsevier
https://www.journals.elsevier.com/current-opinion-in-colloid-and-interface-science
| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Chemistry | 192 | 116 | 135 | 36 |
| Materials Science | 281 | 70 | 83 | 27 |
Current Opinion in Colloid and Interface Science is mainly concerned with subjects like Nanotechnology, Chemical physics, Chemical engineering, Colloid and Polymer. The journal investigates Nanotechnology research which frequently intersects with Particle. Issues in Chemical physics were discussed, taking into consideration concepts from other disciplines like Phase transition, Crystallography, Phase (matter), Molecule and Ion.
While work presented in the journal provided substantial information on Chemical engineering, it also covered topics in Organic chemistry, Adsorption and Aqueous solution. The research on Colloid discussed in Current Opinion in Colloid and Interface Science draws on the closely related field of Rheology. The Rheology study featured in Current Opinion in Colloid and Interface Science draws parallels with the field of Viscoelasticity.
Most of the Polymer studies addressed also intersect with Polymer chemistry. It dives deep in exploring the relationship between the study of Pulmonary surfactant and Micelle.
The published papers mainly tackle studies in Nanotechnology, Chemical engineering, Self-assembly, Polymer and Rheology. The Nanotechnology research presented in the published articles focuses mostly on Colloid and, on occasion, topics in Chemical physics. The most cited publications focus on Chemical engineering but the discussions also offer insight into other areas such as Chromatography and Phase (matter).
The main research concerns discussed in Current Opinion in Colloid and Interface Science are Nanotechnology, Drug delivery, Wetting, Chemical physics and 2019-20 coronavirus outbreak. Concepts in Microbubbles, as well as related topics in Medical ultrasound, are covered in the Nanotechnology research presented in the journal. The studies tackled, which mainly focus on Drug delivery, apply to Pharmacology as well.
The research on Wetting tackled can also make contributions to studies in the areas of Flow (psychology), Thermal, Substrate (electronics) and Contact angle. Current Opinion in Colloid and Interface Science holds forums on Chemical physics that merges themes from other disciplines such as Liquid liquid, Charge (physics), Surface (mathematics), Polyelectrolyte and Evaporation. The in-depth study on Nanoparticle also explores topics in the intersecting field of Biophysics.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Current Opinion in Colloid and Interface Science (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Current Opinion in Colloid and Interface Science (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 9.20% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 12.66% were posted by at least one author from the top 10 institutions publishing in the journal. Another 11.39% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 11.39% of all publications and 64.56% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Anwesha Sarkar;Eric Dickinson
(2020)Mingrui Liao;Huayang Liu;Xi Wang;Xuzhi Hu
(2021)Brent S. Murray
(2020)Xuzhi Hu;Mingrui Liao;Haoning Gong;Lin Zhang
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