| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Physics | 63 | 169 | 290 | 27 |
The journal primarily tackles Condensed matter physics, Analytical chemistry, Optoelectronics, Optics and Thin film. Condensed matter physics research is the primary subject tackled in the journal with a focus on Ferromagnetism. The studies in Analytical chemistry featured incorporate elements of Doping, Silicon, Epitaxy, Annealing (metallurgy) and Ion.
Ion and Atomic physics are closely related fields of research discussed in it. Photoluminescence, Heterojunction, Diode, Semiconductor and Wide-bandgap semiconductor are all areas of Optoelectronics tackled in the journal. Laser and Wavelength are among the concentrations of Optics that garnered much attention in the journal.
Journal of Applied Physics holds forums on Thin film that merges themes from other disciplines such as Crystallography, Substrate (electronics) and Composite material. The journal dives deep in exploring the relationship between the study of Composite material and Metallurgy. It addresses concerns in Magnetization which are intertwined with other disciplines, such as Coercivity and Nuclear magnetic resonance.
The published papers are organized to reinforce research efforts on Analytical chemistry, Condensed matter physics, Optoelectronics, Thin film and Optics. The most cited papers explore topics in Analytical chemistry which can be helpful for research in disciplines like Chemical vapor deposition, Annealing (metallurgy), Doping and Silicon. The study of Condensed matter physics in the most cited papers encompasses disciplines such as Crystallography, as well as fields such as Transmission electron microscopy, all of which overlap with one another.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Journal of Applied Physics (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Journal of Applied Physics (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 8.16% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 10.01% were posted by at least one author from the top 10 institutions publishing in the journal. Another 6.14% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 16.08% of all publications and 67.77% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Maximilian Ruf;Noel H. Wan;Hyeongrak Choi;Dirk Englund;Dirk Englund
(2021)Yi Li;Wei Zhang;Wei Zhang;Vasyl Tyberkevych;Wai Kwong Kwok
(2020)Peter J. Bruggeman;Renee R. Frontiera;Uwe R. Kortshagen;Mark J. Kushner
(2021)Saima A. Siddiqui;Joseph Sklenar;Kisung Kang;Matthew J. Gilbert
(2020)Aleksandr Kurenkov;Shunsuke Fukami;Hideo Ohno
(2020)V. E. Demidov;S. Urazhdin;A. Anane;V. Cros
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