World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
34
Citations
4633
World Ranking
5826
National Ranking
167

Best Publications

  • Low D/sub it/, thermodynamically stable Ga/sub 2/O/sub 3/-GaAs interfaces: fabrication, characterization, and modeling

    M. Passlack;M. Hong;J.P. Mannaerts;R.L. Opila

  • Enhancement-Mode GaAs MOSFETs With an $\hbox{In}_{0.3} \hbox{Ga}_{0.7}\hbox{As}$ Channel, a Mobility of Over 5000 $ \hbox{cm}^{2}/\hbox{V} \cdot \hbox{s}$ , and Transconductance of Over 475 $\mu\hbox{S}/\mu\hbox{m}$

    R.J.W. Hill;D.A.J. Moran;Xu Li;Haiping Zhou

  • On the interface state density at In0.53Ga0.47As/oxide interfaces

    G. Brammertz;H.-C. Lin;M. Caymax;M. Meuris

  • Self-aligned GaAs p-channel enhancement mode MOS heterostructure field-effect transistor

    M. Passlack;J.K. Abrokwah;R. Droopad;Zhiyi Yu

  • High Mobility III-V MOSFETs For RF and Digital Applications

    M. Passlack;P. Zurcher;K. Rajagopalan;R. Droopad

  • Enhancement-Mode GaAs n-Channel MOSFET

    K. Rajagopalan;J. Abrokwah;R. Droopad;M. Passlack

  • Germanium p-Channel FinFET Fabricated by Aspect Ratio Trapping

    Mark J. H. van Dal;Georgios Vellianitis;Blandine Duriez;Gerben Doornbos

  • High mobility NMOSFET structure with high-/spl kappa/ dielectric

    Unknown

  • Demonstration of scaled Ge p-channel FinFETs integrated on Si

    M.J.H. van Dal;G. Vellianitis;G. Doornbos;B. Duriez

  • Benchmarking of III–V n-MOSFET Maturity and Feasibility for Future CMOS

    Unknown

  • An Ultralow-Resistance Ultrashallow Metallic Source/Drain Contact Scheme for III–V NMOS

    R. Oxland;S. W. Chang;Xu Li;S. W. Wang

  • Electronic properties of adsorbates on GaAs(001)-c(2×8)∕(2×4)

    Darby L. Winn;Michael J. Hale;Tyler J. Grassman;Jonathan Z. Sexton

  • Suitability Study of Oxide/Gallium Arsenide Interfaces for MOSFET Applications

    Matthias Passlack;Ravi Droopad;Guy Brammertz

  • Implant-free high-mobility flatband MOSFET: principles of operation

    M. Passlack;K. Rajagopalan;J. Abrokwah;R. Droopad

  • ADVANCING METAL-OXIDE-SEMICONDUCTOR THEORY : STEADY-STATE NONEQUILIBRIUM CONDITIONS

    M. Passlack;M. Hong;E. F. Schubert;G. J. Zydzik

  • 1-$\mu\hbox{m}$ Enhancement Mode GaAs N-Channel MOSFETs With Transconductance Exceeding 250 mS/mm

    Unknown

  • Vertical Gate-All-Around Nanowire GaSb-InAs Core-Shell n-Type Tunnel FETs

    T. Vasen;P. Ramvall;A. Afzalian;G. Doornbos

  • Scaled p-channel Ge FinFET with optimized gate stack and record performance integrated on 300mm Si wafers

    Unknown

  • Methodology for Development of High-κ Stacked Gate Dielectrics on III–V Semiconductors

    Unknown

  • Germanium-based transistors for future high performance and low power logic applications

    Yee-Chia Yeo;Xiao Gong;Mark J. H. van Dal;Georgios Vellianitis

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