1369-8001
Published by: Elsevier
https://www.journals.elsevier.com/materials-science-in-semiconductor-processing
| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Materials Science | 181 | 461 | 614 | 39 |
| Electronics and Electrical Engineering | 184 | 79 | 141 | 19 |
Materials Science in Semiconductor Processing generally zeroes in on subjects such as Analytical chemistry, Optoelectronics, Thin film, Band gap and Doping. Issues in Analytical chemistry were discussed, taking into consideration concepts from other disciplines like Annealing (metallurgy) and Scanning electron microscope. While work presented in the journal provided substantial information on Scanning electron microscope, it also covered topics in Photocatalysis, Nanoparticle, Transmission electron microscopy and Spectroscopy.
In addition to Photocatalysis research, the journal aims to explore topics under Inorganic chemistry, Photochemistry, Nuclear chemistry and X-ray photoelectron spectroscopy. While Optoelectronics is the focus of Materials Science in Semiconductor Processing, it also provided insights into the studies of Layer (electronics) and Nanotechnology. The research on Thin film tackled can also make contributions to studies in the areas of Amorphous solid, Substrate (electronics) and Electrical resistivity and conductivity.
The journal explores the study of Band gap to improve our understanding of the broader topic of Condensed matter physics. Doping research is the primary subject tackled in Materials Science in Semiconductor Processing with a focus on Dopant. It connects research in Silicon with the related topic of Wafer.
The journal papers are organized to address concerns in the fields of Analytical chemistry, Photocatalysis, Thin film, Nanotechnology and Band gap. While Analytical chemistry is the focus of the published papers, it also provides insights into the studies of Doping and Scanning electron microscope. Annealing (metallurgy), Optoelectronics, Substrate (electronics) and Electrical resistivity and conductivity are some topics wherein Thin film research discussed in the most cited articles has an impact.
The primary areas of discussion in the journal are Optoelectronics, Band gap, Doping, Thin film and Analytical chemistry. The research on Optoelectronics featured in Materials Science in Semiconductor Processing combines topics in other fields like Annealing (metallurgy) and Passivation. While Materials Science in Semiconductor Processing focused on Band gap, it was also able to explore topics like Nanoparticle, Thermoelectric effect, Semiconductor and Dielectric.
Some problems in Doping that were presented in it overlapped with concepts under Composite number, Metal and Density functional theory. Discussions in the journal are anchored in the field of Thin film but it branches out to cover the subject of interrelated disciplines, including
Silicon and related Wafer,
Raman spectroscopy together with Hydrothermal circulation.. It deals with Analytical chemistry in conjunction with other fields like
Dopant that intertwine with fields like X-ray photoelectron spectroscopy,
Crystal structure which connect with Phase (matter)..
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Materials Science in Semiconductor Processing (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Materials Science in Semiconductor Processing (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2022 edition, 30.00% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 7.14% were posted by at least one author from the top 10 institutions publishing in the journal. Another 5.36% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 3.57% of all publications and 83.93% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Sunil Kumar;Sunil Kumar;Vladimir Pavelyev;Prabhash Mishra;Prabhash Mishra;Prabhash Mishra;Nishant Tripathi
(2020)S. Akshatha;S. Sreenivasa;L. Parashuram;V. Udaya kumar
(2021)Sze-Mun Lam;Sze-Mun Lam;Jin-Chung Sin;Jin-Chung Sin;Honghu Zeng;Hua Lin
(2021)Gun Chaloeipote;Rat Prathumwan;Kittitat Subannajui;Anurat Wisitsoraat
(2021)Niranjan Ramgir;R. Bhusari;N.S. Rawat;S.J. Patil
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