| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Electronics and Electrical Engineering | 186 | 68 | 144 | 19 |
| Materials Science | 454 | 52 | 67 | 14 |
| Engineering and Technology | 750 | 33 | 51 | 11 |
The primary areas of discussion in the journal are Optoelectronics, Microelectromechanical systems, Electronic engineering, Surface micromachining and Electrical engineering. Some problems in Optoelectronics that were presented in IEEE/ASME Journal of Microelectromechanical Systems overlapped with concepts under Etching (microfabrication) and Nanotechnology. The journal addresses concerns in Nanotechnology which are intertwined with other disciplines, such as Fluidics and Microfabrication.
Topics in Microelectromechanical systems explored in it were investigated in conjunction with research in Acoustics, Optics, Capacitive sensing, Actuator and Cantilever. Actuator research discussed in it aim to provide more information in the subject of Control theory. IEEE/ASME Journal of Microelectromechanical Systems is mostly focused on Surface micromachining, specifically Bulk micromachining.
The Electrical engineering study featured in the journal draws parallels with the field of Capacitance. Concepts in Composite material, as well as related topics in Thin film, are covered in the Silicon research presented in the journal. The work on Wafer presented in the journal focuses on Wafer bonding in particular.
The journal papers are organized to reinforce research efforts on Optoelectronics, Surface micromachining, Electrical engineering, Microelectromechanical systems and Electronic engineering. In addition to Optoelectronics research, the most cited publications aim to explore topics under Cantilever and Nanotechnology. Aside from discussions in Microelectromechanical systems, the most cited publications also deal with the subject of Actuator which intersects with Voltage and Electrostatic generator disciplines.
IEEE/ASME Journal of Microelectromechanical Systems mostly deals with topics like Optoelectronics, Microelectromechanical systems, Resonator, Piezoelectricity and Silicon. Wafer is a major topic of Optoelectronics research presented in it. Topics in Microelectromechanical systems were tackled in line with various other fields like Vibration, Chip, Finite element method, Actuator and Scanner.
In addition to Resonator research, the journal aims to explore topics under Acoustics, Quality (physics), Lithium niobate and Flexural strength. Ultrasonic sensor and Transducer are some topics wherein Piezoelectricity research discussed in the journal have an impact. The Silicon studies in IEEE/ASME Journal of Microelectromechanical Systems expound on topics in
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in IEEE/ASME Journal of Microelectromechanical Systems (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in IEEE/ASME Journal of Microelectromechanical Systems (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 9.09% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 11.00% were posted by at least one author from the top 10 institutions publishing in the journal. Another 11.00% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 28.00% of all publications and 50.00% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Ruochen Lu;Yansong Yang;Steffen Link;Songbin Gong
(2020)Jialin Wang;Mingyo Park;Stefan Mertin;Tuomas Pensala
(2020)Ruochen Lu;Yansong Yang;Steffen Link;Songbin Gong
(2020)Yansong Yang;Ruochen Lu;Songbin Gong
(2020)Unknown
(2023)Guo-Lun Luo;Yuri Kusano;David A. Horsley
(2021)Xuechun Wang;Ahuva Weltman Hirschberg;Huijing Xu;Zachary Slingsby-Smith
(2020)Abhay Kochhar;Ashraf Mahmoud;Yuyi Shen;Nihar Turumella
(2020)Milica Dostanic;Laura M. Windt;Jeroen M. Stein;Berend J. van Meer
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