| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Physics | 264 | 7 | 11 | 5 |
| Materials Science | 375 | 178 | 189 | 18 |
| Chemistry | 689 | 45 | 52 | 10 |
The journal covers a variety of subjects, including Analytical chemistry, Optoelectronics, Chemical engineering, Thin film and Nanotechnology. Current Applied Physics focuses on Analytical chemistry but the discussions also offer insight into other areas such as Scanning electron microscope, Doping and Dielectric. Dielectric study tackled is connected to the field of Ceramic.
The studies in Optoelectronics featured incorporate elements of Layer (electronics), Electrode and Optics. It is focused mainly on Chemical engineering, particularly Nanoparticle. The concepts on Thin film presented in Current Applied Physics can also apply to other research fields, including Annealing (metallurgy), Substrate (electronics) and Band gap.
The Nanotechnology works, particularly on Carbon nanotube are tackled in the journal.
The most cited papers primarily tackle Analytical chemistry, Chemical engineering, Nanotechnology, Optoelectronics and Thin film. The journal publications address concerns in Analytical chemistry which are intertwined with other disciplines, such as Scanning electron microscope, Doping, Band gap and Dielectric. While the primary focus in the most cited publications is Chemical engineering, they also dissect topics surrounding Metallurgy and Coating as a whole.
Current Applied Physics mostly deals with topics like Optoelectronics, Condensed matter physics, Chemical engineering, Analytical chemistry and Thin film. The journal connects the study in Optoelectronics with the closely related area of Electrode. Topics in Condensed matter physics were tackled in line with various other fields like Domain wall (magnetism), Magnetization and Ferroelectricity.
Annealing (metallurgy) and Electrochemistry are some topics wherein Chemical engineering research discussed in the journal have an impact. Current Applied Physics encompasses presentations on Analytical chemistry, specifically X-ray photoelectron spectroscopy, Crystallite and Raman spectroscopy. It explores issues in Thin film which can be linked to other research areas like Layer (electronics) and Substrate (electronics).
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Current Applied Physics (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Current Applied Physics (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 3.40% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 23.12% were posted by at least one author from the top 10 institutions publishing in the journal. Another 9.05% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 18.09% of all publications and 49.75% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
R.S. Pedanekar;S.K. Shaikh;K.Y. Rajpure
(2020)M. Kibbou;Z. Haman;I. Bouziani;N. Khossossi
(2021)S. Swathi;Fuad Ameen;G. Ravi;R. Yuvakkumar
(2020)Jawad Hussain;Rashid Ali;Majid Niaz Akhtar;Mujtaba Hussain Jaffery
(2020)M. Monisha;Ashwitha Nancy D'Souza;Vinod Hegde;Nimitha S. Prabhu
(2020)Chaoyi Zhang;Qian Jiang;Xinyu Wang;Jing Liu
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