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Applied Physics A: Materials Science and Processing
H-index 40

Applied Physics A: Materials Science and Processing

0947-8396

Published by: Springer

https://www.springer.com/journal/339

Ranking & Metrics

Discipline name Position Best Scientists Publications D-Index
Physics 115 15 34 17
Materials Science 213 419 649 35
Chemistry 348 142 201 22

Additional Metrics

Number of Best Scientists*: 714
Documents by Best Scientists*: 969
Top 100 Ranked Scientists*: 9
SCIMAGO H-index: 168
SCIMAGO SJR: 0.486
Impact Factor: 2.8

Overview

Top Research Topics at Applied Physics A?

The journal mainly tackles studies in Analytical chemistry, Optics, Optoelectronics, Thin film and Laser. While the journal focused on Analytical chemistry, it was also able to explore topics like Doping, Silicon and Scanning electron microscope. Some problems in Scanning electron microscope that were presented in the journal overlapped with concepts under Transmission electron microscopy and Chemical engineering.

It concentrates on Optics topics that focus on Wavelength and Metamaterial. Applied Physics A focuses on Optoelectronics research which is adjacent to topics in Nanotechnology. The Thin film works featured in Applied Physics A incorporate elements from Annealing (metallurgy), Substrate (electronics), Mineralogy and Band gap.

The studies in Laser featured incorporate elements of Ablation and Irradiation. The study on Photoluminescence presented in Applied Physics A intersects with the topics under Luminescence.

  • Analytical chemistry (27.18%)
  • Optics (17.33%)
  • Optoelectronics (15.13%)

What are the most cited papers published in the journal?

  • Femtosecond, picosecond and nanosecond laser ablation of solids (2012 citations)
  • Large-scale purification of single-wall carbon nanotubes: process, product, and characterization (1252 citations)
  • Mechanical properties of carbon nanotubes (1246 citations)

Research areas of the most cited articles at Applied Physics A:

The journal publications investigate areas of study like Analytical chemistry, Optics, Laser, Nanotechnology and Optoelectronics. The journal publications deal with Analytical chemistry in conjunction with Thin film and similar fields in Substrate (electronics) and Mineralogy. The most cited publications facilitate discussions on Laser that incorporate concepts from other fields like Irradiation and Ablation.

What topics the last edition of the journal is best known for?

  • Composite material
  • Quantum mechanics
  • Optics

The previous edition focused in particular on these issues:

Applied Physics A investigates studies in Analytical chemistry, Chemical engineering, Optoelectronics, Band gap and Doping. The work on Analytical chemistry tackled in Applied Physics A brings together disciplines like Thin film and Dielectric. The Thin film study tackled is a key component of adjacent topics in the area of Annealing (metallurgy).

Topics in Dielectric were tackled in line with various other fields like Composite material and Condensed matter physics. Applied Physics A addresses concerns in Chemical engineering which are intertwined with other disciplines, such as Photocatalysis and Scanning electron microscope. The research on Optoelectronics featured in Applied Physics A combines topics in other fields like Layer (electronics) and Substrate (electronics).

The most cited articles from the last journal are:

  • Radiation shielding characterizations and investigation of TeO 2 –WO 3 –Bi 2 O 3 and TeO 2 –WO 3 –PbO glasses (43 citations)
  • X-ray shielding characteristics of P 2 O 5 –Nb 2 O 5 glass doped with Bi 2 O 3 by using EPICS2017 and Phy-X/PSD (25 citations)
  • 13-93B3 Bioactive glasses containing Ce 3+ , Ga 3+ and V 5+ : dose rate and gamma radiation characteristic for medical purposes (19 citations)

Papers citation over time

A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

The top authors publishing in Applied Physics A (based on the number of publications) are:

  • Dieter Bäuerle (62 papers) absent at the last edition,
  • Minghui Hong (37 papers) absent at the last edition,
  • R. Stanley Williams (37 papers) absent at the last edition,
  • Roland Wiesendanger (37 papers) absent at the last edition,
  • Thomas Lippert (35 papers) absent at the last edition.

The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.

Only papers with recognized affiliations are considered

The top affiliations publishing in Applied Physics A (based on the number of publications) are:

  • Chinese Academy of Sciences (625 papers) published 12 papers at the last edition, 13 less than at the previous edition,
  • Max Planck Society (401 papers) absent at the last edition,
  • Centre national de la recherche scientifique (272 papers) published 5 papers at the last edition, 1 more than at the previous edition,
  • Nanjing University (265 papers) published 3 papers at the last edition the same number as at the previous edition,
  • Russian Academy of Sciences (170 papers) published 4 papers at the last edition, 3 less than at the previous edition.

The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2021 edition, 7.83% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 5.58% were posted by at least one author from the top 10 institutions publishing in the journal. Another 3.30% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 7.48% of all publications and 83.65% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

  • Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
  • Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
  • Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
  • Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
  • Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.

Top Publications

  • Irradiation induced modification of structural and optical properties of potassium sodium niobate thin films

    Radhe Shyam;Mahendra Singh Rathore;Arun Vinod;Apurba Das

    (2020)
    284 Citations
  • CeVO4/rGO nanocomposite: facile hydrothermal synthesis, characterization, and electrochemical hydrogen storage

    Unknown

    (2022)
    232 Citations
  • Investigation of barium borate glasses for radiation shielding applications

    M. S. Al-Buriahi;C. Sriwunkum;Halil Arslan;Baris T. Tonguc

    (2020)
    196 Citations
  • Bio-inspired iron oxide nanoparticles using Psidium guajava aqueous extract for antibacterial activity

    Ngozi Madubuonu;Samson O. Aisida;Ishaq Ahmad;Ishaq Ahmad;S. Botha

    (2020)
    130 Citations
  • Synthesis, thermal, optical, mechanical and radiation-attenuation characteristics of borate glass system modified by Bi2O3/MgO

    (2022)
    118 Citations
  • B2O3–Bi2O3–TeO2–BaO and TeO2–Bi2O3–BaO glass systems: a comparative assessment of gamma-ray and fast and thermal neutron attenuation aspects

    G. Lakshminarayana;M. G. Dong;M. S. Al-Buriahi;Ashok Kumar

    (2020)
    113 Citations
  • Radiation shielding characterizations and investigation of TeO2–WO3–Bi2O3 and TeO2–WO3–PbO glasses

    Aljawhara H. Almuqrin;M. I. Sayyed;M. I. Sayyed

    (2021)
    102 Citations
  • Oxyfluoro-tellurite-zinc glasses and the nuclear-shielding ability under the substitution of AlF 3 by ZnO

    M. I. Sayyed;Hakan Akyildirim;M. S. Al-Buriahi;Eloic Lacomme

    (2020)
    89 Citations

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