| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Materials Science | 628 | 46 | 56 | 7 |
| Chemistry | 935 | 15 | 15 | 5 |
The journal was organized to reinforce research efforts on Analytical chemistry, Composite material, Crystallography, Thin film and Metallurgy. While work presented in the journal provided substantial information on Analytical chemistry, it also covered topics in Annealing (metallurgy), Substrate (electronics), Silicon and Scanning electron microscope. It features research on Substrate (electronics) in an attempt to reinforce studies in the field of Layer (electronics).
The study on Composite material featured in Surface Review and Letters expounds on the topic of Composite number in particular. Crystallography research featured in Surface Review and Letters incorporates concerns from various other topics such as Epitaxy, Monolayer, Adsorption, Diffraction and Scanning tunneling microscope. It facilitates discussions on Adsorption that incorporate concepts from other fields like Inorganic chemistry and Molecule.
Surface Review and Letters explores topics in Thin film which can be helpful for research in disciplines like Optoelectronics and Chemical engineering. It investigates Metallurgy research which frequently intersects with Coating.
Crystallography, Analytical chemistry, Adsorption, Condensed matter physics and Optics are the main subjects of interest in the published articles. While Crystallography is the key highlight in the journal publications, thet also covered some subjects on Annealing (metallurgy) and Thin film. Issues in Analytical chemistry were discussed in the journal articles, taking into consideration concepts from other disciplines like Inorganic chemistry, Spectroscopy and Scanning electron microscope.
Surface Review and Letters tackles a plethora of topics, such as Composite material, Metallurgy, Chemical engineering, Corrosion and Surface roughness. Surface Review and Letters concentrated on Composite material research, specifically Microstructure, Composite number, Aluminium, Tribology and Layer (electronics). Alloy and Wear resistance are some topics wherein Microstructure research discussed in the journal have an impact.
Topics in Chemical engineering were tackled in line with various other fields like Characterization (materials science) and Thin film. Sputter deposition is part of Thin film studies tackled in the journal. While Surface roughness is the focus of the journal, it also provided insights into the studies of Taguchi methods, Tool wear, Machining and Vibration.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Surface Review and Letters (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Surface Review and Letters (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 15.27% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 6.98% were posted by at least one author from the top 10 institutions publishing in the journal. Another 2.91% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 9.88% of all publications and 80.23% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Ahmed A. Al-Amiery
(2021)Abbas Z. Salman;Qusay A. Jawad;Khalid S. Ridah;Lina M. Shaker
(2020)Xuanye Leng;Siyu Chen;Kou Yang;Musen Chen
(2021)Xuanye Leng;Siyu Chen;Kou Yang;Musen Chen
(2021)Ill-Min Chung;Venkatesan Hemapriya;Ponnusamy Kanchana;Natarajan Arunadevi
(2020)Zarbad Shah;Tofail Arshad;Kausar Shaheen;Kausar Shaheen;Sher Bahadar Khan
(2021)Yufeng Zhang;Guoliang Chen;Yaming Wang;Yongchun Zou
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