0960-8974
Published by: Elsevier
https://www.sciencedirect.com/journal/progress-in-crystal-growth-and-characterization-of-materials
| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Materials Science | 857 | 7 | 5 | 2 |
The foci of Progress in Crystal Growth and Characterization of Materials are Crystal growth, Analytical chemistry, Optics, Mineralogy and Crystallography. The studies on Crystal growth discussed can also contribute to research in the domains of Chemical physics, Optoelectronics, Crystallization and Crystal. The concepts on Optoelectronics presented in the journal can also apply to other research fields, including Metalorganic vapour phase epitaxy, Molecular beam epitaxy and Thin film, Nanotechnology.
The presented research on Thin film deals specifically with Epitaxy but it also addresses topics in Semiconductor. The Nanotechnology works, particularly on Characterization (materials science) are tackled in it. Analytical chemistry research featured in Progress in Crystal Growth and Characterization of Materials incorporates concerns from various other topics such as Inorganic chemistry, Single crystal and Doping.
Research on Optics presented in Progress in Crystal Growth and Characterization of Materials focuses, in particular, on Laser and Nonlinear optics. It explores research in Mineralogy and the adjacent study of Chemical engineering. The studies tackled, which mainly focus on Crystallography, apply to Nucleation as well.
The published articles aim to foster the development of research in Nanotechnology, Optoelectronics, Mineralogy, Crystal growth and Epitaxy. The journal papers explore issues in Nanotechnology which can be linked to other research areas like Photonics, Oxide and Grain size. The most cited publications facilitate discussions on Optoelectronics that incorporate concepts from other fields like Metalorganic vapour phase epitaxy, Single crystal and Optics.
Progress in Crystal Growth and Characterization of Materials explores disciplines such as Characterization (materials science), Nanotechnology, Chemical engineering, Energy storage and Optoelectronics. The journal focuses on Characterization (materials science) but the discussions also offer insight into other areas such as Material properties, Layer (electronics), Substrate (electronics), Neutron detection and Wide-bandgap semiconductor. Progress in Crystal Growth and Characterization of Materials emphasizes research on Nanotechnology, which includes concerns such as Thin film.
It addresses concerns in Chemical engineering which are intertwined with other disciplines, such as In situ, Optical microscope, Growth kinetics and Ice crystals. The studies in Energy storage featured incorporate elements of Nanoparticle, Graphite, Agglomerate, Carbon and Nanomaterials. Topics in Optoelectronics were tackled in line with various other fields like Sapphire and Optical fiber.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Progress in Crystal Growth and Characterization of Materials (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Progress in Crystal Growth and Characterization of Materials (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 11.11% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 37.50% were posted by at least one author from the top 10 institutions publishing in the journal. Another 0.00% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 25.00% of all publications and 37.50% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
C.V. Ramana;A. Mauger;C.M. Julien
(2021)Laxman Singh;Ravikant Sharma;Narayan Singh;Atendra Kumar
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