| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Chemistry | 882 | 25 | 26 | 6 |
| Engineering and Technology | 1020 | 16 | 20 | 7 |
The journal tackles a plethora of topics, such as Plasma, Atomic physics, Analytical chemistry, Tokamak and Optics. Plasma research featured in the journal incorporates concerns from various other topics such as Mechanics, Computational physics and Magnetic field. While Atomic physics is the focus of it, it also provided insights into the studies of Ion, Plasma parameters, Electron and Electric field.
It explores topics in Analytical chemistry which can be helpful for research in disciplines like Atmospheric pressure, Spectroscopy, Scanning electron microscope and Electrode, Dielectric barrier discharge. Most of the works presented in Plasma Science & Technology deals with Tokamak but it intersects with the subject of Nuclear engineering. Plasma Science & Technology emphasizes research on Optics, which includes concerns such as Laser.
The published papers tackle a plethora of topics, such as Plasma, Analytical chemistry, Atomic physics, Optics and Tokamak. The journal publications explore research in Nuclear engineering and overlapping concepts in Current (fluid) to expand the discourse in Plasma. The most cited publications tackle studies in Beam (structure) and the interrelated subject of Neutral beam injection to gain insights into Atomic physics.
Plasma Science & Technology mostly deals with topics like Plasma, Atomic physics, Optoelectronics, Tokamak and Mechanics. Electron density is a primary topic of Plasma research in the journal. The journal facilitates discussions on Atomic physics that incorporate concepts from other fields like Helicon and Electron.
The studies in Tokamak featured incorporate elements of Computational physics and Edge (geometry). The journal features Composite material research that overlaps with concepts in Dielectric barrier discharge.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Plasma Science & Technology (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Plasma Science & Technology (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 70.35% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 54.24% were posted by at least one author from the top 10 institutions publishing in the journal. Another 8.47% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 10.17% of all publications and 27.12% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Shuai Zhang;Yuan Gao;Hao Sun;Zhe Fan
(2021)Jintao Qiu;Cheng Zhang;Zehui Liu;Bangdou Huang
(2021)Chengyan Ren;Chuansheng Zhang;Duo Hu;Cheng Zhang
(2020)Xiaoxing Zhang;Xiaoxing Zhang;Yuan Tian;Zhaolun Cui;Ju Tang
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