0914-9244
Published by: Technical Association of Photopolymers, Japan
| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Materials Science | 667 | 29 | 47 | 6 |
| Chemistry | 926 | 25 | 35 | 5 |
Resist, Nanotechnology, Polymer chemistry, Polymer and Photochemistry are among the topics commonly tackled in the journal. Issues in Resist were discussed, taking into consideration concepts from other disciplines like Optoelectronics, Lithography, Extreme ultraviolet lithography, Optics and Photoresist. The research on Polymer chemistry featured in it combines topics in other fields like Copolymer, Polymerization, Polyimide, Organic chemistry and Monomer.
The journal focuses on Polymer research as part of the broader topic of Composite material. The research on Photochemistry discussed in it draws on the closely related field of Photopolymer.
The journal articles cover a variety of subjects, including Resist, Polymer chemistry, Polymer, Nanotechnology and Lithography. While work presented in the published articles provide substantial information on Resist, it also covers topics in Optoelectronics, Extreme ultraviolet lithography, Optics, Photoresist and Analytical chemistry. While the journal articles focused on Polymer, they were also able to explore topics like Photochemistry and Dissolution.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Journal of Photopolymer Science and Technology (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Journal of Photopolymer Science and Technology (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 100.00% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, nan% were posted by at least one author from the top 10 institutions publishing in the journal. Another nan% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included nan% of all publications and nan% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Takushi Shimane;Tsukasa Watanabe;Nohara Yokota;Futoshi Matsumoto
(2020)Jingyuan Deng;Florian Kaefer;Sean Bailey;Yusuke Otsubo
(2021)Hiroyuki Maekawa;Hiroto Kudo;Takeo Watanabe;Hiroki Yamamoto
(2020)Hinako Ebe;Takayuki Chiba;Satoru Ohisa;Junji Kido
(2020)Dong Xue;Shinpei Kamiya;Masahiko Saito;Itaru Osaka
(2020)Marina Doi;Koichiro Muto;Mayuko Nara;Naiqiang Liang
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