2050-7534
Published by: Royal Society of Chemistry
https://www.rsc.org/journals-books-databases/about-journals/journal-of-materials-chemistry-c/
| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Materials Science | 46 | 2415 | 4025 | 85 |
| Chemistry | 69 | 1429 | 2468 | 64 |
Journal of Materials Chemistry C focuses largely on the fields of Optoelectronics, Nanotechnology, Photochemistry, Luminescence and Analytical chemistry. Optoelectronics and OLED are closely related fields of research discussed in the journal. OLED research presented in Journal of Materials Chemistry C encompasses a variety of subjects, including Electroluminescence and Phosphorescence.
The featured Nanotechnology studies mainly concentrate on Polymer but also cover areas of interest in Polymer chemistry. The work on Photochemistry tackled in the journal brings together disciplines like Acceptor, Molecule and Fluorescence. The research on Molecule discussed in Journal of Materials Chemistry C draws on the closely related field of Crystallography.
The studies on Luminescence discussed can also contribute to research in the domains of Ion, Photoluminescence and Phosphor. It focused on Photoluminescence research but expanded to cover Quantum yield. Dopant is part of Doping studies tackled in it.
The published articles are mainly concerned with subjects like Nanotechnology, Optoelectronics, Luminescence, Analytical chemistry and Photochemistry. Semiconductor, Polymer and Electronics are some topics wherein Nanotechnology research discussed in the published papers has an impact. While Optoelectronics is the key highlight in the most cited publications, thet also covered some subjects on OLED and Electroluminescence and Phosphorescence.
Journal of Materials Chemistry C investigates areas of study like Optoelectronics, Photochemistry, Luminescence, Perovskite (structure) and Photoluminescence. The Optoelectronics research presented places emphasis on topics like Doping, Quantum efficiency, Diode, Photodetector and Band gap. Aside from discussions in Quantum efficiency, the journal also deals with the subject of OLED which intersects with Electroluminescence and Phosphorescence disciplines.
In Journal of Materials Chemistry C, Acceptor, Molecule and Fluorescence are investigated in conjunction with one another to address concerns in Photochemistry research. The Luminescence research presented falls under the domain of Analytical chemistry. The in-depth study on Photoluminescence also explores topics in the intersecting field of Quantum yield.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Journal of Materials Chemistry C (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Journal of Materials Chemistry C (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 5.44% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 23.76% were posted by at least one author from the top 10 institutions publishing in the journal. Another 8.40% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 17.06% of all publications and 50.78% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Karim Khan;Ayesha Khan Tareen;Muhammad Aslam;Renheng Wang
(2020)Giorgio Schileo;Giulia Grancini
(2021)Zaihua Duan;Yadong Jiang;Huiling Tai
(2021)Haibo Zhang;Tian Wei;Qi Zhang;Weigang Ma
(2020)Jin-Ming Teng;Yin-Feng Wang;Chuan-Feng Chen
(2020)Di Hu;Zhongbin Pan;Xiang Zhang;Haoran Ye
(2020)Robert Freer;Anthony V. Powell
(2020)Jia Liang;Balaji Devakumar;Liangling Sun;Shaoying Wang
(2020)Zhen Xiang;Zhen Xiang;Juan Xiong;Baiwen Deng;Erbiao Cui
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