2190-4286
Published by: Beilstein-Institut zur Förderung der Chemischen Wissenschaften
| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Materials Science | 405 | 113 | 135 | 16 |
| Engineering and Technology | 957 | 16 | 17 | 8 |
The main points discussed in the journal deals with Nanotechnology, Chemical engineering, Nanoparticle, Optoelectronics and Analytical chemistry. Beilstein Journal of Nanotechnology facilitated presentations on Nanotechnology research, particularly Nanostructure, Graphene, Thin film, Carbon nanotube and Nanoscopic scale. The work on Chemical engineering tackled in it brings together disciplines like Photocatalysis, Catalysis, Oxide, Scanning electron microscope and Polymer.
The study on Nanoparticle presented is investigated in conjunction with research in Transmission electron microscopy.
The journal papers investigate studies in Nanotechnology, Nanoparticle, Chemical engineering, Graphene and Photocatalysis. Issues in Nanotechnology were discussed in the journal papers, taking into consideration concepts from other disciplines like Biophysics and Surface modification. The journal articles facilitate discussions on Chemical engineering that incorporate concepts from other fields like Catalysis and Raman spectroscopy.
The journal mainly deals with areas of study such as Nanotechnology, Chemical engineering, Nanoparticle, Optoelectronics and Scanning electron microscope. The featured Nanotechnology studies mainly concentrate on Nanolithography but also cover areas of interest in Ion beam. The Chemical engineering research presented in it explores the relationship between Oxide and the closely related topic of X-ray photoelectron spectroscopy.
The journal holds forums on Nanoparticle that merges themes from other disciplines such as Biophysics, Nanomaterials and Catalysis. The Optoelectronics works featured in it incorporate elements from Transmission electron microscopy and Nanorod. Beilstein Journal of Nanotechnology explores research in Nanostructure alongside concepts in Substrate (electronics) and other areas of study in Monolayer.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Beilstein Journal of Nanotechnology (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Beilstein Journal of Nanotechnology (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 11.63% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 14.47% were posted by at least one author from the top 10 institutions publishing in the journal. Another 14.47% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 13.16% of all publications and 57.89% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Valentina Francia;Daphne Montizaan;Anna Salvati
(2020)Stefania Castelletto;Faraz A Inam;Shin-Ichiro Sato;Alberto Boretti
(2020)Tuba Evgin;Alpaslan Turgut;Georges Hamaoui;Zdenko Spitalsky
(2020)Shanshan Wang;Wei Sun;Dong-sheng Yang;Fuqian Yang
(2020)Pallellappa Chithaiah;Madhan Mohan Raju;Giridhar U Kulkarni;C N R Rao
(2020)Thies H Büscher;Stanislav N Gorb
(2021)Jing Han;Nuo Xu;Yuchen Liang;Mei Ding
(2021)Maximilian Wassner;Markus Eckardt;Andreas Reyer;Thomas Diemant
(2020)Secil Öztürk;Yu-Xuan Xiao;Dennis Dietrich;Beatriz Giesen
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