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IEEE

2020 IEEE International Workshop on Electromagnetics: Applications and Student Innovation Competition (iWEM)

Location: Penghu , Taiwan

Conference dates: 8/26/2020 - 8/28/2020

Research H-index
4

Ranking & Metrics

Discipline name Position Best Scientists Publications D-Index
Electronics and Electrical Engineering 464 53 100 4

Call for Papers

2020 IEEE International Workshop on Electromagnetics (iWEM 2020) will be held during August 26-28 at beautiful island Penghu, Taiwan and hosted by the Department of Communication Engineering, National Penghu University of Science and Technology. We sincerely invite all experts and scholars to participate and welcome contributions to Workshop Proceedings.

Topics include but are not limited to:
The topics include, but are not limited to, the following technical areas:
Electromagnetic Theory
Applied Electromagnetics
RF, Microwave, Millimeter Wave Components and Circuits
Computational Electromagnetics
Instrumentation and Measurement
Millimeter Wave, THz Technologies
Advanced Materials and Processes in RF and THz
Wireless Power Transmission and Harvesting
Biomedical Techniques and Devices
Electromagnetic Detection, Imaging and Inversion
Antennas and Propagation
Array Antenna and MIMO System
Wireless Systems
MMIC/RFIC
EMC/EMI
Other EM Topics

Overview

This comprehensive ranking presents a detailed evaluation of scientific conferences in the field of Electronics and Electrical Engineering. Developed by Research.com—one of the leading platforms in science research across all major disciplines—this ranking leverages nearly a decade of experience providing trusted data on scientific contributions, with a specific focus on Electronics and Electrical Engineering since 2014.

The ranking is determined by a proprietary bibliometric score, uniquely created by Research.com. This score integrates both the estimated h-index and the number of leading scientists who have presented at each conference within the last three years, thereby offering a multifaceted assessment of a conference’s scientific impact and reputation. All Impact Score values reflected in this listing were collected as of 2024-11-27.

The compilation process involved an exhaustive review of more than 2,204 conferences, each rigorously selected following careful examination of over 95,378 scientific publications produced in the preceding three years by 6,160 prominent and respected researchers in the field. This robust methodology ensures a nuanced, accurate, and authoritative reflection of current trends and excellence in Electronics and Electrical Engineering conferences.

For a complete explanation of the metrics and procedures utilized in establishing these rankings, please refer to our Methodology Page.

Papers citation over time

A key indicator for each conference is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

The top authors publishing at IEEE International Workshop on Electromagnetics: Applications and Student Innovation Competition (based on the number of publications) are:

  • Nobuyoshi Kikuma (20 papers) absent at the last edition,
  • Kunio Sakakibara (20 papers) absent at the last edition,
  • Hiroyuki Arai (15 papers) absent at the last edition,
  • Quan Xue (12 papers) absent at the last edition,
  • Kwai-Man Luk (11 papers) published 1 paper at the last edition the same number as at the previous edition.

The overall trend for top authors publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top authors.

Only papers with recognized affiliations are considered

The top affiliations publishing at IEEE International Workshop on Electromagnetics: Applications and Student Innovation Competition (based on the number of publications) are:

  • University of Electronic Science and Technology of China (44 papers) absent at the last edition,
  • Nanjing University of Science and Technology (31 papers) absent at the last edition,
  • City University of Hong Kong (27 papers) published 1 paper at the last edition the same number as at the previous edition,
  • Nagoya Institute of Technology (21 papers) absent at the last edition,
  • Yokohama National University (16 papers) absent at the last edition.

The overall trend for top affiliations publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions at the conference edition to all articles published within that conference. The best research institutions were selected based on the largest number of articles published during all editions of the conference.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2019 edition, 0.00% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 100.00% were posted by at least one author from the top 10 institutions publishing at the conference. Another 0.00% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 0.00% of all publications and 0.00% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of conferences they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same conference from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the conference in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing at a conference. The index includes the authors publishing at the last edition of a conference, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

  • Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
  • Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
  • Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
  • Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
  • Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.

Related Online Degrees & Career Pathways

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