The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Donald J. Siegel sits on this spectrum.
This scientist: 166 publications — 20th percentile
20% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,295 publications or more.
The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Donald J. Siegel sits on this spectrum.
This scientist: 64 D-Index — 56th percentile
56% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 159 D-Index or more.
Donald J. Siegel is affiliated with The University of Texas at Austin in the United States. Their research spans primarily the fields of engineering and materials science, with a focus on electrical and electronic engineering and materials chemistry. Subfields of study also include inorganic chemistry, mechanical engineering, and automotive engineering.
Their work extensively covers topics such as advanced battery materials and technologies, advancements in battery materials, thermal expansion and ionic conductivity, and metal-organic frameworks with applications. Additional research themes include advanced battery technologies research, perovskite materials and applications, and solid-state spectroscopy and crystallography.
Donald J. Siegel has published research in several venues, frequently contributing to ECS Meeting Abstracts, the Journal of the American Chemical Society, Advanced Energy Materials, Chemistry of Materials, and ACS Applied Materials & Interfaces.
Some of the recent papers authored by or associated with their research group include:
The scientist collaborates frequently with several co-authors, notably including Kwangnam Kim, Yet-Ming Chiang, Jeffrey G. Smith, Alauddin Ahmed, and Saul H. Lapidus.
Jun Jun Yang;Andrea C Sudik;Christopher Wolverton;Donald J. Siegel
Asma Sharafi;Eric Kazyak;Andrew L. Davis;Seungho Yu
Seungho Yu;Robert D. Schmidt;Regina Garcia-Mendez;Erik Herbert
Alauddin Ahmed;Saona Seth;Justin Purewal;Antek G. Wong-Foy
Asma Sharafi;Seungho Yu;Michael Naguib;Marcus Lee
Maxwell D. Radin;Jill F. Rodriguez;Feng Tian;Donald J. Siegel
Travis Thompson;Seungho Yu;Logan Williams;Robert D. Schmidt
Maxwell D. Radin;Donald J. Siegel
Lynn Trahey;Fikile R. Brushett;Fikile R. Brushett;Nitash P. Balsara;Nitash P. Balsara;Nitash P. Balsara;Gerbrand Ceder;Gerbrand Ceder;Gerbrand Ceder
Jacob Goldsmith;Antek G. Wong-Foy;Michael J. Cafarella;Donald J. Siegel
Aniruddha Biswas;Aniruddha Biswas;Donald J. Siegel;C. Wolverton;David N. Seidman
Donald J Siegel;Louis G Hector;James B Adams
Mark D. Allendorf;Zeric Hulvey;Zeric Hulvey;Thomas Gennett;Thomas Gennett;Alauddin Ahmed
Seungho Yu;Donald J. Siegel
Donald J. Siegel;Louis G. Hector;James B. Adams
Feng Tian;Maxwell D. Radin;Donald J. Siegel
Donald J. Siegel;Donald J. Siegel
Jeff Wolfenstine;Jan L. Allen;Jeff Sakamoto;Donald J. Siegel
Alauddin Ahmed;Yiyang Liu;Justin Purewal;Ly D. Tran
Kuthuru Suresh;Darpandeep Aulakh;Justin Purewal;Donald J Siegel
D. Liu;D. Liu;J.J. Purewal;J.J. Purewal;J. Yang;A. Sudik
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