Thin Solid Films

Top Research Topics at Thin Solid Films?

The journal was organized to reinforce research efforts on Thin film, Analytical chemistry, Optoelectronics, Composite material and Chemical engineering. It holds forums on Thin film that merges themes from other disciplines such as Annealing (metallurgy), Substrate (electronics), Mineralogy and Optics. In addition to Substrate (electronics) research, Thin Solid Films aims to explore topics under Crystallography and Epitaxy.

Electrical resistivity and conductivity and Crystallite are some topics wherein Mineralogy research discussed in the journal have an impact. The research on Analytical chemistry tackled can also make contributions to studies in the areas of Amorphous solid, Chemical vapor deposition, Silicon and Scanning electron microscope. Chemical vapor deposition research featured in the journal incorporates concerns from various other topics such as Carbon film and Deposition (phase transition).

Doping, Heterojunction and Photoluminescence are among the areas of Optoelectronics tackled. Thin Solid Films connects the study in Composite material with the closely related area of Metallurgy. Issues in Chemical engineering were discussed, taking into consideration concepts from other disciplines like Inorganic chemistry and Nanotechnology.

• Thin film (41.44%)
• Analytical chemistry (36.78%)
• Optoelectronics (15.31%)

What are the most cited papers published in the journal?

• Buildup of ultrathin multilayer films by a self-assembly process: III. Consecutively alternating adsorption of anionic and cationic polyelectrolytes on charged surfaces (2377 citations)
• Transparent conductors—A status review (2351 citations)
• Fabrication of thin film dye sensitized solar cells with solar to electric power conversion efficiency over 10 (1613 citations)

Research areas of the most cited articles at Thin Solid Films:

The journal publications facilitate discussions on Thin film, Analytical chemistry, Mineralogy, Composite material and Chemical engineering. The works on Thin film tackled in the journal articles bring together disciplines like Optoelectronics, Substrate (electronics) and Optics. While the published papers focused on Analytical chemistry, they were also able to explore topics like Amorphous solid, Annealing (metallurgy), Electrical resistivity and conductivity and Scanning electron microscope.

What topics the last edition of the journal is best known for?

• Composite material
• Quantum mechanics
• Organic chemistry

The previous edition focused in particular on these issues:

The aim of the journal is to expand the discussion of research in Thin film, Optoelectronics, Chemical engineering, Analytical chemistry and Composite material. Sputter deposition is a primary topic of Thin film research in the journal. The studies in Optoelectronics featured incorporate elements of Indium tin oxide and Electrode.

The concepts on Chemical engineering presented in Thin Solid Films can also apply to other research fields, including Oxide, Chemical vapor deposition, Polymer and Scanning electron microscope. The presented research on Analytical chemistry deals specifically with Doping but it also addresses topics in Conductivity. It focuses on Layer (electronics) but the discussions also offer insight into other areas such as Amorphous solid, Metal and Surface roughness.

The most cited articles from the last journal are:

• Mechanisms of carrier lifetime enhancement and conductivity-type switching on hydrogen-incorporated arsenic-doped BaSi2 (3 citations)
• Relationship between structure, surface topography and tribo-mechanical behavior of Ti-N thin films elaborated at different N2 flow rates (3 citations)
• Plasma-treated room temperature synthesized CuCrO2/Au/CuCrO2 on Polyethylene terephthalate: Towards a high-performance flexible p-type transparent conductor (3 citations)

Papers citation over time

A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

Top authors and change over time

The top authors publishing in Thin Solid Films (based on the number of publications) are:

• Lars Hultman (81 papers) absent at the last edition,
• Mitsumasa Iwamoto (78 papers) absent at the last edition,
• Elvira Fortunato (70 papers) absent at the last edition,
• Hyung Ho Park (69 papers) absent at the last edition,
• Rodrigo Martins (67 papers) absent at the last edition.

The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.

Top affiliations and change over time

Only papers with recognized affiliations are considered

The top affiliations publishing in Thin Solid Films (based on the number of publications) are:

• Centre national de la recherche scientifique (955 papers) published 4 papers at the last edition, 1 less than at the previous edition,
• Chinese Academy of Sciences (761 papers) published 10 papers at the last edition, 9 less than at the previous edition,
• Tokyo Institute of Technology (469 papers) absent at the last edition,
• Max Planck Society (442 papers) published 2 papers at the last edition,
• National Cheng Kung University (380 papers) published 5 papers at the last edition, 1 more than at the previous edition.

The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2021 edition, 8.24% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 7.78% were posted by at least one author from the top 10 institutions publishing in the journal. Another 3.59% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 8.68% of all publications and 79.94% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

• Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
• Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
• Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
• Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
• Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.