| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Chemistry | 506 | 22 | 42 | 16 |
| Engineering and Technology | 581 | 21 | 51 | 15 |
Plasma Sources Science and Technology investigates areas of study like Plasma, Atomic physics, Analytical chemistry, Electron and Ion. Plasma research presented in Plasma Sources Science and Technology encompasses a variety of subjects, including Magnetic field and Atmospheric pressure. Helium and Atmospheric-pressure plasma are some topics wherein Atmospheric pressure research discussed in Plasma Sources Science and Technology have an impact.
It connects the study in Atmospheric-pressure plasma with the closely related area of Jet (fluid). The journal features studies on Atomic physics, including topics such as Argon. The presented research on Analytical chemistry deals specifically with Cathode but it also addresses topics in Anode.
The Electron works featured in the journal incorporate elements from Excited state, Computational physics, Excitation and Boltzmann equation. Plasma Sources Science and Technology centers on topics in Ion, with a focus on Charged particle. The journal explores studies in Dielectric barrier discharge as part of the wider topic of Dielectric.
The journal publications mostly deal with topics like Plasma, Atomic physics, Analytical chemistry, Ion and Electron. The published papers focus on Plasma but the discussions also offer insight into other areas such as Electric field, Optics and Atmospheric pressure. The most cited papers explore issues in Atomic physics which can be linked to other research areas like Ionization, Electron density and Plasma diagnostics.
Plasma Sources Science and Technology focuses largely on the fields of Plasma, Atomic physics, Analytical chemistry, Electron and Ionization. The concepts on Plasma presented in the journal can also apply to other research fields, including Ion, Molecular physics, Microwave and Argon. In addition to Atomic physics research, it aims to explore topics under High-power impulse magnetron sputtering, Atmospheric pressure, Electron ionization, Electric field and Excitation.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Plasma Sources Science and Technology (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Plasma Sources Science and Technology (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 63.16% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 23.08% were posted by at least one author from the top 10 institutions publishing in the journal. Another 16.48% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 24.18% of all publications and 36.26% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Bangdou Huang;Cheng Zhang;Igor Adamovich;Yuri Akishev
(2020)Bhagirath Ghimire;Endre J Szili;Bethany L Patenall;Pradeep Lamichhane
(2021)K. Van 'T Veer;K. Van 'T Veer;François Reniers;Annemie A M B A. Bogaerts
(2020)Bangfa Peng;Kefeng Shang;Zhengyan Liu;Xiaomei Yao
(2020)Lars Schücke;Jan-Luca Gembus;Niklas Peters;Friederike Kogelheide
(2020)Aric C Rousso;Aric C Rousso;Benjamin M Goldberg;Benjamin M Goldberg;Timothy Y Chen;Shuqun Wu;Shuqun Wu
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