| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Chemistry | 735 | 32 | 43 | 9 |
The journal investigates studies in Analytical chemistry, Atomic physics, Chemical engineering, Argon and Inorganic chemistry. Some problems in Analytical chemistry that were presented in Plasma Chemistry and Plasma Processing overlapped with concepts under Hydrogen, Atmospheric pressure, Volumetric flow rate, Ion and Dielectric barrier discharge. It dives deep in exploring the relationship between the study of Hydrogen and Methane.
The study on Atmospheric pressure presented is investigated in conjunction with research in Atmospheric-pressure plasma. Topics in Dielectric barrier discharge explored in Plasma Chemistry and Plasma Processing were investigated in conjunction with research in Decomposition and Nonthermal plasma. While Atomic physics is the focus of Plasma Chemistry and Plasma Processing, it also provided insights into the studies of Cathode, Ionization, Electron density and Boltzmann equation.
Plasma Chemistry and Plasma Processing connects research in Chemical engineering with the related topic of Organic chemistry. It addresses concerns in Inorganic chemistry which are intertwined with other disciplines, such as Catalysis, Oxygen and Aqueous solution.
The most cited papers facilitate discussions on Analytical chemistry, Inorganic chemistry, Atomic physics, Dielectric barrier discharge and Atmospheric pressure. The published papers hold forums on Analytical chemistry that merge themes from other disciplines such as Decomposition, Nonthermal plasma, Volumetric flow rate, Oxygen and Methane. The journal publications focus on Dielectric barrier discharge but the discussions also offer insight into other areas such as Chemical engineering and Toluene, Organic chemistry, Ozone.
The journal is mainly concerned with subjects like Chemical engineering, Analytical chemistry, Dielectric barrier discharge, Atmospheric pressure and Dissociation (chemistry). The presented Chemical engineering research provided insight into the related
Topics in Argon were tackled in line with various other fields like Thermal conductivity and Composite material. The studies on Dielectric barrier discharge discussed can also contribute to research in the domains of NOx, Coating and Ozone. Atmospheric pressure research featured in it incorporates concerns from various other topics such as Atmospheric-pressure plasma and X-ray photoelectron spectroscopy.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Plasma Chemistry and Plasma Processing (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Plasma Chemistry and Plasma Processing (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 5.49% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 16.28% were posted by at least one author from the top 10 institutions publishing in the journal. Another 10.47% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 17.44% of all publications and 55.81% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Tian Chang;Tian Chang;Tian Chang;Chuanlong Ma;Zhenxing Shen;Savita Kaliya Perumal Veerapandian
(2021)Kefeng Shang;Ning Wang;Wenfeng Li;Nan Jiang
(2021)Anna Dzimitrowicz;Aleksandra Bielawska-Pohl;Piotr Jamroz;Jerzy Dora
(2020)Quan-Zhi Zhang;WeiZong Wang;Christophe Thille;Annemie Bogaerts
(2020)Shixin Liu;Yangyang Liu;Duihai Tang;Yuxin Miao;Yuxin Miao
(2021)Anna Dzimitrowicz;Aleksandra Bielawska-Pohl;Pawel Pohl;Dorota Jermakowicz-Bartkowiak
(2020)Aurélien Lepoetre;Stéphanie Ognier;Mengxue Zhang;Julien Wengler
(2021)Zhaolun Cui;Xiaoxing Zhang;Xiaoxing Zhang;Yuan Tian;Yalong Li
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