Published by: Springer
| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Physics | 21 | 107 | 224 | 57 |
| Materials Science | 50 | 428 | 476 | 85 |
The journal covers a variety of subjects, including Optoelectronics, Optics, Plasmon, Nanophotonics and Photonics. Optoelectronics research presented in the journal encompasses a variety of subjects, including Laser, Nonlinear optics and Graphene. Light-Science & Applications primarily discusses Laser topics, particularly Femtosecond, Ultrashort pulse and Lasing threshold.
The Optics research presented places emphasis on topics like Quantum optics, Polarization (waves), Wavelength, Wavefront and Microscopy. Research on Microscopy addressed in it frequently intersections with the field of Microscope. The journal holds forums on Plasmon that merges themes from other disciplines such as Nanotechnology and Metamaterial.
The study on Nanophotonics presented in the journal intersects with the topics under Optical coherence tomography. The studies in Photonics featured incorporate elements of Resonator and Photonic crystal.
The published papers are mainly concerned with subjects like Optoelectronics, Optics, Nanophotonics, Plasmon and Optical communication. The journal articles with studies in Optoelectronics featured incorporate elements of Laser and Nonlinear optics. The journal articles focus on Nanophotonics but also tackle concerns of closely connected disciplines like
Light-Science & Applications explores disciplines such as Optoelectronics, Optics, Photonics, Laser and Quantum. Light-Science & Applications focuses on different Optoelectronics studies like Photodetector, Quantum dot, Light-emitting diode, Semiconductor and Diode. The work on Optics addressed in Light-Science & Applications expands to the thematically related Nonlinear system.
In addition to Photonics research, Light-Science & Applications aims to explore topics under Nanophotonics, Resonator and Photonic crystal. Most of the works presented in Light-Science & Applications deals with Ultrashort pulse but it intersects with the subject of Femtosecond.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Light-Science & Applications (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Light-Science & Applications (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 0.00% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 40.85% were posted by at least one author from the top 10 institutions publishing in the journal. Another 14.55% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 14.08% of all publications and 30.52% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Yuge Huang;En-Lin Hsiang;Ming-Yang Deng;Shin-Tson Wu
(2020)Jianghao Xiong;En-Lin Hsiang;Ziqian He;Tao Zhan
(2021)Zhenwei Jia;Chenxu Yuan;Yongfu Liu;Xiao-Jun Wang
(2020)Zhaojun Liu;Chun Ho Lin;Byung Ryool Hyun;Chin Wei Sher
(2020)Jungho Mun;Minkyung Kim;Younghwan Yang;Trevon Badloe
(2020)Unknown
(2022)Zhiwei Peng;Xiaolin Chen;Yulong Fan;David J. Srolovitz
(2020)Li Zhang;Changjiu Sun;Tingwei He;Yuanzhi Jiang
(2021)Wenjuan Zhu;Wenbo Ma;Yirong Su;Zeng Chen
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