| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Electronics and Electrical Engineering | 202 | 71 | 141 | 18 |
| Physics | 225 | 25 | 22 | 7 |
The journal mainly tackles studies in Plasma, Atomic physics, Electrical engineering, Optics and Electron. Topics in Plasma explored in the journal were investigated in conjunction with research in Mechanics, Magnetic field, Electrode and Computational physics. The journal links adjacent topics like Mechanics with Arc (geometry).
IEEE Transactions on Plasma Science investigates Arc (geometry) research which frequently intersects with Electric arc. The studies in Atomic physics featured incorporate elements of Ion, Ionization, Cathode and Electric field. Discussions in IEEE Transactions on Plasma Science are anchored in the subject of Cathode and the similar topic of Anode.
The Electrical engineering works featured in the journal incorporate elements from Power (physics) and Optoelectronics. Some problems in Optics that were presented in the journal overlapped with concepts under Gyrotron, Microwave and Cathode ray.
The most cited publications investigate studies in Plasma, Atomic physics, Electrical engineering, Optics and Cathode. The studies on Plasma discussed at the published papers can also contribute to research in the domains of Mechanics, Computational physics and Atmospheric pressure. The works on Atomic physics tackled in the published papers bring together disciplines like Electric field, Ion, Ionization, Electron and Electric arc.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in IEEE Transactions on Plasma Science (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in IEEE Transactions on Plasma Science (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 17.43% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 20.28% were posted by at least one author from the top 10 institutions publishing in the journal. Another 4.72% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 10.28% of all publications and 64.72% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Kai-Da Xu;Sen Lu;Ying-Jiang Guo;Qiang Chen
(2021)Zefeng Yang;Pan Xu;Wenfu Wei;Guoqiang Gao
(2020)David Chernin;Y. Y. Lau;John J. Petillo;Serguei Ovtchinnikov
(2020)Wenjie Feng;Xueke Ma;Yongrong Shi;Suyang Shi
(2020)Leidan Pan;Yongle Wu;Weimin Wang;Yiwen Wei
(2020)Zheng Zhuang;Yongle Wu;Qinghua Yang;Mengdan Kong
(2020)Mengdan Kong;Yongle Wu;Zheng Zhuang;Weimin Wang
(2020)Antonio Breno de Alleluia;Ahmed F. Abdelshafy;Paulius Ragulis;Artem Kuskov
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