| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Materials Science | 669 | 25 | 38 | 6 |
The journal focuses largely on the fields of Analytical chemistry, Optics, Thin film, Optoelectronics and Nanotechnology. Some problems in Analytical chemistry that were presented in European Physical Journal-applied Physics overlapped with concepts under Doping, Silicon, Plasma, Annealing (metallurgy) and Scanning electron microscope. The study on Plasma presented is investigated in conjunction with research in Atomic physics.
The journal explores research in Atomic physics and the adjacent study of Electron. Laser is a major topic of Optics research presented in European Physical Journal-applied Physics. European Physical Journal-applied Physics focuses on Thin film but the discussions also offer insight into other areas such as Composite material, Substrate (electronics) and Band gap.
The Nanotechnology study featured in it draws connections with the study of Chemical engineering.
The journal papers are organized to address concerns in the fields of Analytical chemistry, Optics, Thin film, Nanotechnology and Atomic physics. The studies on Analytical chemistry discussed at the journal papers can also contribute to research in the domains of Amorphous solid, Spectroscopy, Plasma and Refractive index. While work presented in the most cited articles provide substantial information on Optics, it also covers topics in Optoelectronics, Dielectric and Microwave.
The objective of European Physical Journal-applied Physics is to combine knowledge in the areas of Chemical engineering, Composite material, Optoelectronics, Thin film and Band gap. Composite material research featured in European Physical Journal-applied Physics incorporates concerns from various other topics such as Atmospheric-pressure plasma, X-ray photoelectron spectroscopy and Atmospheric pressure. In it, Annealing (metallurgy), Organic solar cell, Photovoltaic system and Spin coating are investigated in conjunction with one another to address concerns in Optoelectronics research.
European Physical Journal-applied Physics addresses concerns in Thin film which are intertwined with other disciplines, such as Phenomenological model, Flux, Magnetoresistance, Substrate (electronics) and Quantum fluctuation. While it focused on Band gap, it was also able to explore topics like Analytical chemistry, Dip-coating, Molybdenum, Spectroscopy and Monoclinic crystal system. Analytical chemistry research presented in it encompasses a variety of subjects, including Nanocomposite, Doping, Lattice constant, Refractive index and Irradiation.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in European Physical Journal-applied Physics (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in European Physical Journal-applied Physics (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 16.18% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 15.79% were posted by at least one author from the top 10 institutions publishing in the journal. Another 3.51% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 10.53% of all publications and 70.18% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Mohamed El Jouad;El Mehdi Bouabdalli;Samira Touhtouh;Mohammed Addou
(2020)Patrick Dietz;Felix Becker;Konstantin Keil;Kristof Holste
(2020)Dalila Salem;Manal Shalabi;Fathi Souissi;Farida Nemmar
(2020)Fathi Bendelala;Ali Cheknane;Mohammed Benatallah;Jean-Michel Nunzi
(2021)Abdelkader Rjafallah;Abdelowahed Hajjaji;Fouad Belhora;Abdessamad El Ballouti
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