| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Materials Science | 721 | 13 | 17 | 5 |
Applied Science and Convergence Technology mainly tackles studies in Analytical chemistry, Optoelectronics, Thin film, Nanotechnology and Chemical engineering.
The most cited papers generally zeroe in on subjects such as Thin film, Optoelectronics, Analytical chemistry, Amorphous solid and Sputter deposition. In particular, the Optoelectronics works presented in the most cited papers emphasize discussions on Light-emitting diode. While work presented in the journal articles provide substantial information on Analytical chemistry, it also covers topics in Ruthenium oxide and Supercapacitor, Electrochemical supercapacitors.
Applied Science and Convergence Technology facilitates discussions on Chemical engineering, Optoelectronics, Electrode, Plasma and Thin film. Topics in Chemical engineering explored in the journal were investigated in conjunction with research in Etching (microfabrication) and Organic solar cell. Many of the research works in Optoelectronics, specifically Quantum tunnelling, closely connected to disciplines like Wireless.
The Electrode works featured in it incorporate elements from Radar cross section reduction, Intensity (heat transfer), Optics and Photovoltaic system. The research on Plasma tackled can also make contributions to studies in the areas of Carbon composites, Suspension (vehicle) and Quadrupole mass analyzer. The journal addresses concerns in Thin film which are intertwined with other disciplines, such as Annealing (metallurgy), Absorption (electromagnetic radiation), Surface modification and Analytical chemistry.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Applied Science and Convergence Technology (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Applied Science and Convergence Technology (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 6.25% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 50.00% were posted by at least one author from the top 10 institutions publishing in the journal. Another 10.00% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 26.67% of all publications and 13.33% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Seoung-Woong Park;Seoung-Woong Park;Jo Yong Jun;Sukang Bae;Byung Hee Hong
(2020)June Young Kim;Won Ik Jeong;M.A.I. Elgarhy;M.A.I. Elgarhy;Jaeyoung Choi
(2020)Gye-Won Kim;Yong Jun Kim;Han-Ki Kim
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