| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Electronics and Electrical Engineering | 283 | 47 | 66 | 13 |
| Mechanical and Aerospace Engineering | 294 | 26 | 30 | 8 |
| Materials Science | 510 | 54 | 65 | 11 |
| Engineering and Technology | 682 | 60 | 76 | 12 |
Journal of Micromechanics and Microengineering mainly deals with areas of study such as Optoelectronics, Nanotechnology, Composite material, Microelectromechanical systems and Optics. Journal of Micromechanics and Microengineering holds forums on Optoelectronics that merges themes from other disciplines such as Surface micromachining, Electronic engineering and Electrical engineering. The journal features studies on Electrical engineering, including topics such as Voltage.
The Nanotechnology works featured in the journal incorporate elements from Lithography and Microfabrication. Composite material study tackled is connected to the field of Thin film. It facilitates discussions on Microelectromechanical systems that incorporate concepts from other fields like Mechanical engineering and Actuator.
The journal explores issues in Silicon which can be linked to other research areas like Etching (microfabrication), Substrate (electronics) and Analytical chemistry. Some problems in Microfluidics that were presented in it overlapped with concepts under Fluidics and Microchannel. It features research on Microchannel in an attempt to reinforce studies in the field of Mechanics.
The journal articles primarily tackle Optoelectronics, Nanotechnology, Composite material, Microelectromechanical systems and Electrical engineering. The published articles facilitate discussions on Optoelectronics that incorporate concepts from other fields like Cantilever, Surface micromachining and Electronic engineering. In addition to Nanotechnology research, the most cited articles aim to explore topics under Fluidics and Microfabrication.
The journal aims to foster the development of research in Optoelectronics, Composite material, Nanotechnology, Microfluidics and Microelectromechanical systems. The research on Optoelectronics tackled can also make contributions to studies in the areas of Thin film, Surface micromachining and Electric field. Journal of Micromechanics and Microengineering explores research in Nanotechnology and the adjacent study of Microfabrication.
Discussions in it are anchored in the subject of Microfluidics and the similar topic of Mechanics. The journal focuses on Microelectromechanical systems as well as the interrelated topic of Acoustics. The journal focuses on Resonator as well as the interrelated topic of Quality (physics).
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Journal of Micromechanics and Microengineering (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Journal of Micromechanics and Microengineering (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 62.35% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 14.75% were posted by at least one author from the top 10 institutions publishing in the journal. Another 4.92% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 19.67% of all publications and 60.66% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Ruochen Lu;Songbin Gong
(2021)Xianhao Le;Qiongfeng Shi;Philippe Vachon;Eldwin Jiaqiang Ng
(2021)Xinge Guo;Long Liu;Zixuan Zhang;Shan Gao
(2021)Honggang Zhang;Nan Zhang;Michael D Gilchrist;Fengzhou Fang;Fengzhou Fang
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