| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Materials Science | 598 | 46 | 140 | 8 |
| Engineering and Technology | 1360 | 8 | 11 | 3 |
Integrated Ferroelectrics mainly tackles studies in Thin film, Ferroelectricity, Optoelectronics, Analytical chemistry and Dielectric. The concepts on Thin film presented in Integrated Ferroelectrics can also apply to other research fields, including Annealing (metallurgy), Substrate (electronics), Composite material and Electrode. Topics in Composite material explored in Integrated Ferroelectrics were investigated in conjunction with research in Sol-gel and Lead zirconate titanate.
The study of Ferroelectricity encompasses disciplines such as Condensed matter physics, as well as fields such as Electric field, all of which overlap with one another. Layer (electronics), Capacitor, Voltage and Microwave are some topics wherein Optoelectronics research discussed in Integrated Ferroelectrics have an impact. Capacitor and Capacitance are closely related fields of research discussed in it.
Analytical chemistry research featured in it incorporates concerns from various other topics such as Metalorganic vapour phase epitaxy, Doping, Phase (matter), Scanning electron microscope and Pulsed laser deposition. While Dielectric is the focus of it, it also provided insights into the studies of Perovskite (structure), Mineralogy and Ceramic. The Ceramic study featured in Integrated Ferroelectrics draws connections with the study of Sintering.
The most cited publications tackle a plethora of topics, such as Ferroelectricity, Thin film, Optoelectronics, Dielectric and Capacitor. The Ferroelectricity research tackled in the journal publications is interrelated with Condensed matter physics which concerns subjects like Nuclear magnetic resonance. The published articles facilitate discussions on Thin film that incorporate concepts from other fields like Annealing (metallurgy), Composite material, Electrode and Analytical chemistry.
The discussions in the journal mainly cover the fields of Composite material, Ceramic, Optoelectronics, Metallurgy and Dielectric. It links adjacent topics like Composite material with Ferroelectricity. In addition to Ceramic research, Integrated Ferroelectrics aims to explore topics under Doping, Sintering, Phase (matter), Composite number and Microstructure.
Sintering research discussed connects with the study of Flexural strength. Some problems in Optoelectronics that were presented in the journal overlapped with concepts under Layer (electronics), Aluminium, Crystal and Laser. Many of the studies tackled connect Dielectric with a similar field of study like Lead (electronics).
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Integrated Ferroelectrics (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Integrated Ferroelectrics (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 21.95% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 13.28% were posted by at least one author from the top 10 institutions publishing in the journal. Another 15.62% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 7.03% of all publications and 64.06% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Pengfei Yin;Limin Zhang;Xing Feng;Jian Wang
(2020)Hai-Lin Cong;Fei-Fei Jia;Song Wang;Ming-Tao Yu
(2020)P. Limkitjaroenporn;W. Cheewasukhanont;S. Kothan;J. Kaewkhao
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