Published by: Elsevier
| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Chemistry | 356 | 78 | 93 | 22 |
Graphene, Chemical engineering, Nanotechnology, Oxide and Electrochemistry are among the topics commonly tackled in the journal. The close relationship between Nanomaterials and Nanostructure is one of the points of interest dissected in Graphene research. While Chemical engineering is the focus of it, it also provided insights into the studies of Catalysis and Adsorption.
Catalysis research presented in it encompasses a variety of subjects, including Electrocatalyst, Oxygen evolution and Overpotential. FlatChem focuses on Nanotechnology but sometimes tackles the closely related topic of Semiconductor which is concerned with Monolayer. While work presented in it provided substantial information on Electrochemistry, it also covered topics in Detection limit and Anode.
Heterojunction is a major topic of Optoelectronics research presented in the journal. The study of Capacitance serves as the foundation of the Supercapacitor research discussed in FlatChem. FlatChem investigates Exfoliation joint research which frequently intersects with Raman spectroscopy.
The most cited publications tackle a plethora of topics, such as Graphene, Nanotechnology, Chemical engineering, Nanomaterials and Graphite. The most cited publications about Functionalized graphene research are fields of study within Graphene but they also intertwine with concepts in Human welfare. While work presented in the published papers provide substantial information on Chemical engineering, it also covers topics in Desalination, Supercapacitor, Electrochemistry and Oxide.
The journal mainly tackles studies in Graphene, Chemical engineering, Oxide, Nanotechnology and Electrochemistry. The research on Graphene featured in it combines topics in other fields like Supercapacitor, Composite material, Nanomaterials and Nanostructure. The research on Chemical engineering tackled can also make contributions to studies in the areas of Electrocatalyst, Nanowire, Catalysis and Adsorption.
The studies in Oxide featured incorporate elements of Epoxide, Hydroquinone, Electrochemical gas sensor, Dielectric spectroscopy and Dispersity. The overlapping concepts between Metal-organic framework and Gas separation are the key highlights of Nanotechnology study. The work on Electrochemistry tackled in it brings together disciplines like Detection limit and Anode.
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in FlatChem (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in FlatChem (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 5.63% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 23.88% were posted by at least one author from the top 10 institutions publishing in the journal. Another 11.94% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 17.91% of all publications and 46.27% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
Neeraj Kumar;Reza Salehiyan;Vongani Chauke;Orebotse Joseph Botlhoko
(2021)Muhammad Aadil;Majid Mahmood;Muhammad Farooq Warsi;Ibrahim A Alsafari
(2021)Shelly Singla;Surbhi Sharma;Soumen Basu;Nagaraj P. Shetti
(2020)Twinkle Mathew;R. Aishwarya Sree;S. Aishwarya;Khan Kounaina
(2020)Shikandar D. Bukkitgar;Nagaraj P. Shetti;Kakarla Raghava Reddy;Tawfik A. Saleh
(2020)Mahesh M. Shanbhag;Nagaraj P. Shetti;Shweta J. Malode;Ravindra S. Veerapur
(2021)Jiahui Shen;Zhiyi Wu;Chaoran Li;Chengcheng Zhang
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