| Discipline name | Position | Best Scientists | Publications | D-Index |
|---|---|---|---|---|
| Materials Science | 365 | 41 | 36 | 20 |
The journal covers a variety of subjects, including Nanotechnology, Optoelectronics, Semiconductor, Condensed matter physics and Thin film. The work tackled in Critical Reviews in Solid State and Materials Sciences goes beyond the discipline of Nanotechnology as it also encompasses Oxide. The study on Optoelectronics presented in the journal intersects with subjects under the field of Epitaxy.
The most cited papers tackle a plethora of topics, such as Nanotechnology, Thin film, Semiconductor, Condensed matter physics and Composite material. The most cited publications focus on Nanotechnology but the discussions also offer insight into other areas such as Biocompatibility and Oxide. The journal publications address concerns in Thin film which are intertwined with other disciplines, such as Optoelectronics, Mineralogy, Optics and Analytical chemistry.
The concepts of Nanotechnology, Optoelectronics, Graphene, Chemical engineering and Metal are tackled in the journal. Nanotechnology research presented in Critical Reviews in Solid State and Materials Sciences encompasses a variety of subjects, including Photocatalysis and Photovoltaics. It facilitates discussions on Optoelectronics that incorporate concepts from other fields like Matrix (mathematics), Emission spectrum and Thin film.
Anti-corrosion and Electronics are some topics wherein Graphene research discussed in the journal have an impact. The Chemical engineering research discussed in Critical Reviews in Solid State and Materials Sciences can contribute to the expansion of the discourse in closely related subjects like
A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing in Critical Reviews in Solid State and Materials Sciences (based on the number of publications) are:
The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing in Critical Reviews in Solid State and Materials Sciences (based on the number of publications) are:
The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 4.65% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 14.63% were posted by at least one author from the top 10 institutions publishing in the journal. Another 9.76% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 21.95% of all publications and 53.66% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
G. D. Goh;Y. L. Yap;H. K. J. Tan;S. L. Sing
(2020)Zhikang Shen;Yuquan Ding;Adrian P. Gerlich
(2020)Kaushik Pal;Asiya Si;Gharieb S. El-Sayyad;M. Abd Elkodous
(2021)Rajesh Kumar;Rajesh Kumar;Sumanta Sahoo;Ednan Joanni;Rajesh K. Singh
(2021)Kaushik Pal;Kaushik Pal;Nidhi Asthana;Alaa A Aljabali;Sheetal K. Bhardwaj
(2021)G K Sujan;Zengxi Stephen Pan;Hui Jun Li;Daniel Liang
(2020)Devang Sejani;Wenya Li;Vivek Patel
(2021)Elochukwu Stephen Agudosi;Ezzat Chan Abdullah;Arshid Numan;Nabisab Mujawar Mubarak
(2020)Fahad Saleem Ahmed Khan;N. M. Mubarak;Mohammad Khalid;Mohammad Mansoob Khan
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