Photogrammetric Engineering & Remote Sensing

Top Research Topics at Photogrammetric Engineering and Remote Sensing?

The journal aims to foster the development of research in Remote sensing, Cartography, Artificial intelligence, Computer vision and Photogrammetry. It explores research in Remote sensing and the adjacent study of Pixel. While Cartography is the focus of it, it also provided insights into the studies of Land cover, Land use and Vegetation.

The study on Artificial intelligence presented is investigated in conjunction with research in Pattern recognition. The work tackled in Photogrammetric Engineering and Remote Sensing goes beyond the discipline of Photogrammetry as it also encompasses Computer graphics (images). The main emphasis of it is the research on Multispectral image, emphasizing the topic of Multispectral pattern recognition.

• Remote sensing (42.86%)
• Cartography (21.94%)
• Artificial intelligence (19.78%)

What are the most cited papers published in the journal?

• Completion of the 2011 National Land Cover Database for the Conterminous United States – Representing a Decade of Land Cover Change Information (1917 citations)
• Extracting topographic structure from digital elevation data for geographic information-system analysis (1884 citations)
• Image-Based Atmospheric Corrections - Revisited and Improved (1558 citations)

Research areas of the most cited articles at Photogrammetric Engineering and Remote Sensing:

The most cited articles explore disciplines such as Remote sensing, Cartography, Thematic Mapper, Artificial intelligence and Land cover. The journal articles address concerns in Remote sensing which are intertwined with other disciplines, such as Pixel and Vegetation. The published papers facilitate discussions on Cartography that incorporate concepts from other fields like Remote sensing (archaeology), Digital elevation model and Land use.

What topics the last edition of the journal is best known for?

• Artificial intelligence
• World War II
• Ecology

The previous edition focused in particular on these issues:

The journal primarily focuses on research topics in Remote sensing, Artificial intelligence, Computer vision, Geodetic datum and Impervious surface. The majority of Remote sensing studies in the journal are focused on the subject of Remote sensing (archaeology). In Photogrammetric Engineering and Remote Sensing, Land cover, Scale (ratio) and Pattern recognition are investigated in conjunction with one another to address concerns in Artificial intelligence research.

Geodetic datum is a subtopic of Cartography and Geodesy, which is among the main concerns addressed in it. The Cartography works featured in it incorporate elements from Kingdom and The Republic. Topics in Impervious surface explored in it were investigated in conjunction with research in Medium resolution and Impervious surface area.

The most cited articles from the last journal are:

• Scene Classification of Remotely Sensed Images via Densely Connected Convolutional Neural Networks and an Ensemble Classifier (2 citations)
• Fully Convolutional Neural Network for Impervious Surface Segmentation in Mixed Urban Environment (2 citations)
• Least Squares Adjustment with a Rank-Deficient Weight Matrix and Its Applicability to Image/Lidar Data Processing (1 citations)

Papers citation over time

A key indicator for each journal is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

Top authors and change over time

The top authors publishing in Photogrammetric Engineering and Remote Sensing (based on the number of publications) are:

• Clifford J. Mugnier (38 papers) published 4 papers at the last edition, 2 more than at the previous edition,
• Peng Gong (35 papers) absent at the last edition,
• Russell G. Congalton (28 papers) absent at the last edition,
• John R. Jensen (26 papers) absent at the last edition,
• Ayman Habib (25 papers) published 2 papers at the last edition.

The overall trend for top authors publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top authors.

Top affiliations and change over time

Only papers with recognized affiliations are considered

The top affiliations publishing in Photogrammetric Engineering and Remote Sensing (based on the number of publications) are:

• Hong Kong Polytechnic University (28 papers) absent at the last edition,
• United States Geological Survey (25 papers) absent at the last edition,
• Wuhan University (21 papers) absent at the last edition,
• Indiana University (13 papers) absent at the last edition,
• California Institute of Technology (13 papers) absent at the last edition.

The overall trend for top affiliations publishing in this journal is outlined below. The chart shows the number of publications at each edition of the journal for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions in the journal edition to all articles published within that journal. The best research institutions were selected based on the largest number of articles published during all editions of the journal.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2021 edition, 100.00% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, nan% were posted by at least one author from the top 10 institutions publishing in the journal. Another nan% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included nan% of all publications and nan% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of journals they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same journal from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the journal in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing in a journal. The index includes the authors publishing at the last edition of a journal, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

• Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
• Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
• Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
• Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
• Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.

Career Opportunities in Photogrammetric Engineering and Remote Sensing

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