D-Index & Metrics Best Publications

D-Index & Metrics

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Engineering and Technology D-index 32 Citations 6,654 54 World Ranking 4633 National Ranking 1711

Overview

What is he best known for?

The fields of study he is best known for:

  • Mechanical engineering
  • Composite material
  • Electrical engineering

His primary scientific interests are in Optoelectronics, Analytical chemistry, Layer, Dielectric and Silicon oxide. His work on Semiconductor and Integrated circuit as part of general Optoelectronics study is frequently linked to Electric field, bridging the gap between disciplines. His study in Analytical chemistry is interdisciplinary in nature, drawing from both Substrate and Chemical vapor deposition.

His Layer research integrates issues from Inorganic chemistry, Mixing, Silicon and Nitrogen. His Dielectric research focuses on Composite material and how it connects with Oxygen content. His Silicon oxide study introduces a deeper knowledge of Substrate.

His most cited work include:

  • Integration of remote plasma generator with semiconductor processing chamber (387 citations)
  • Accelerated plasma clean (237 citations)
  • Semiconductor processing system and methods using capacitively coupled plasma (230 citations)

What are the main themes of his work throughout his whole career to date?

His scientific interests lie mostly in Optoelectronics, Silicon oxide, Substrate, Dielectric and Layer. The study incorporates disciplines such as Trench, Substrate and Analytical chemistry in addition to Optoelectronics. His Silicon oxide study incorporates themes from Inorganic chemistry, Dry etching and Oxide thin-film transistor.

His Substrate research incorporates themes from Silicon nitride, Thin film, Silicon carbide, Etching and Chemical engineering. His research in Dielectric intersects with topics in Organosilicon, Nanotechnology, Carbon, Deposition and Shallow trench isolation. The various areas that he examines in his Layer study include Organic compound, Mixing, Electronic engineering and Silicon.

He most often published in these fields:

  • Optoelectronics (31.63%)
  • Silicon oxide (29.59%)
  • Substrate (27.55%)

What were the highlights of his more recent work (between 2013-2019)?

  • Remote plasma (15.31%)
  • Optoelectronics (31.63%)
  • Etching (10.20%)

In recent papers he was focusing on the following fields of study:

Shankar Venkataraman spends much of his time researching Remote plasma, Optoelectronics, Etching, Wafer and Cathode. Remote plasma connects with themes related to Analytical chemistry in his study. His Optoelectronics research includes elements of Oxide and Shallow trench isolation.

Shankar Venkataraman interconnects Substrate and Substrate in the investigation of issues within Etching. He studies Substrate, namely Silicon oxide. His Silicon oxide research is multidisciplinary, incorporating perspectives in Inorganic chemistry and Excitation.

Between 2013 and 2019, his most popular works were:

  • Processing systems and methods for halide scavenging (162 citations)
  • Selective etch of silicon nitride (139 citations)
  • Insulated semiconductor faceplate designs (119 citations)

In his most recent research, the most cited papers focused on:

  • Mechanical engineering
  • Composite material
  • Organic chemistry

Shankar Venkataraman mainly investigates Remote plasma, Etching, Electronic engineering, Chemical engineering and Substrate. The Remote plasma study combines topics in areas such as Substrate, Patterned substrate and Analytical chemistry. His research integrates issues of Process engineering, Insert, Semiconductor and Process in his study of Electronic engineering.

His study in Chemical engineering is interdisciplinary in nature, drawing from both Silicon nitride, Silicon, Silicon oxide and Nanotechnology. His Substrate research integrates issues from Inorganic chemistry, Excitation and Doping.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Integration of remote plasma generator with semiconductor processing chamber

Janakiraman Karthik;Fong Kelly;Chen Chen-An;Le Paul.
(2000)

600 Citations

Accelerated plasma clean

Shankar N. Chandran;Scott Hendrickson;Gwendolyn D. Jones;Shankar Venkataraman.
(2004)

361 Citations

Semiconductor processing system and methods using capacitively coupled plasma

Jang-Gyoo Yang;Matthew L. Miller;Xinglong Chen;Kien N. Chuc.
(2011)

356 Citations

Formation of a liquid-like silica layer by reaction of an organosilicon compound and a hydroxyl forming compound

David W Cheung;Frederick Gaillard;Shin-Puu Jeng;Chi-I Lang.
(1999)

347 Citations

Semiconductor processing systems having multiple plasma configurations

드미트리 루보미르스키;싱롱 첸;샨카르 벤카타라만.
(2013)

346 Citations

Method of depositing dielectric materials in damascene applications

Ju-hyung Lee;Ping Xu;Shankar Venkataraman;Li-Qun Xia.
(2002)

322 Citations

Method of depositing low dielectric constant silicon carbide layers

Francimar Campana;Srinivas Nemani;Michael Chapin;Shankar Venkataraman.
(2003)

286 Citations

Method and apparatus for cleaning a cvd chamber

Maosheng Zhao;Juan Carlos Rocha-Alvarez;Inna Shmurun;Soova Sen.
(2003)

250 Citations

Processing systems and methods for halide scavenging

Wang Anchuan;Chen Xinglong;Li Zihui;Hamana Hiroshi.
(2014)

243 Citations

Heated gas distribution plate for a processing chamber

Lun Tsuei;Soovo Sen;Ju-hyung Lee;Juan Carlos Rocha-Alvarez.
(2002)

234 Citations

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