D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Electronics and Electrical Engineering D-index 63 Citations 12,125 404 World Ranking 815 National Ranking 388

Overview

What is he best known for?

The fields of study he is best known for:

  • Electrical engineering
  • Transistor
  • Semiconductor

Edward J. Nowak mainly focuses on Optoelectronics, Electrical engineering, Field-effect transistor, Transistor and Electronic engineering. Specifically, his work in Optoelectronics is concerned with the study of Semiconductor. His research investigates the connection with Electrical engineering and areas like Silicon on insulator which intersect with concerns in Shallow trench isolation.

His Field-effect transistor research includes themes of Electrical conductor, Wafer, Nanotechnology and Capacitance. He interconnects Plane, Electron mobility, Static random-access memory and Integrated circuit in the investigation of issues within Transistor. His studies deal with areas such as Node, Dynamic control, Dielectric and Coincident as well as Electronic engineering.

His most cited work include:

  • Fin fet devices from bulk semiconductor and method for forming (261 citations)
  • Finfet SRAM cell using low mobility plane for cell stability and method for forming (225 citations)
  • Strained Fin FETs structure and method (216 citations)

What are the main themes of his work throughout his whole career to date?

Edward J. Nowak spends much of his time researching Optoelectronics, Electrical engineering, Field-effect transistor, Transistor and Semiconductor. The concepts of his Optoelectronics study are interwoven with issues in Layer, Substrate, Gate oxide and Electronic engineering. Edward J. Nowak works mostly in the field of Gate oxide, limiting it down to concerns involving Gate dielectric and, occasionally, Dielectric.

His Electronic engineering research is multidisciplinary, incorporating elements of Oxide and Integrated circuit. His Electrical engineering research is multidisciplinary, incorporating perspectives in Doping and Conductor. His biological study spans a wide range of topics, including Wafer, Capacitance, Communication channel, Fin and Electrical conductor.

He most often published in these fields:

  • Optoelectronics (74.95%)
  • Electrical engineering (43.88%)
  • Field-effect transistor (27.12%)

What were the highlights of his more recent work (between 2010-2020)?

  • Optoelectronics (74.95%)
  • Electrical engineering (43.88%)
  • Field-effect transistor (27.12%)

In recent papers he was focusing on the following fields of study:

His primary areas of study are Optoelectronics, Electrical engineering, Field-effect transistor, Semiconductor and Electronic engineering. His Optoelectronics study combines topics in areas such as Layer and Transistor, Gate dielectric, Gate oxide. His Electrical engineering study integrates concerns from other disciplines, such as Capacitance and Silicon on insulator.

The various areas that Edward J. Nowak examines in his Field-effect transistor study include eDRAM, Communication channel and MOSFET. The Semiconductor study combines topics in areas such as Trench, Doping, Conductor and Insulator. His Electronic engineering study incorporates themes from Semiconductor device, Silicon and Epitaxy.

Between 2010 and 2020, his most popular works were:

  • Dense pitch bulk finfet process by selective epi and etch (182 citations)
  • Vertical field effect transistors (80 citations)
  • Methods of forming field effect transistors using a gate cut process following final gate formation (43 citations)

In his most recent research, the most cited papers focused on:

  • Electrical engineering
  • Transistor
  • Semiconductor

The scientist’s investigation covers issues in Optoelectronics, Electrical engineering, Semiconductor, Field-effect transistor and Electronic engineering. His Optoelectronics research includes elements of Layer, Transistor, Gate oxide and Fin. His work in Layer tackles topics such as Conductor which are related to areas like Isolation layer.

In his study, Wafer is inextricably linked to Silicon on insulator, which falls within the broad field of Semiconductor. His work carried out in the field of Field-effect transistor brings together such families of science as Capacitance and MOSFET. The study incorporates disciplines such as Substrate and Integrated circuit in addition to Electronic engineering.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

High-performance CMOS variability in the 65-nm regime and beyond

K. Bernstein;D. J. Frank;A. E. Gattiker;W. Haensch.
Ibm Journal of Research and Development (2006)

691 Citations

Silicon CMOS devices beyond scaling

W. Haensch;E. J. Nowak;R. H. Dennard;P. M. Solomon.
Ibm Journal of Research and Development (2006)

541 Citations

Turning silicon on its edge [double gate CMOS/FinFET technology]

E.J. Nowak;I. Aller;T. Ludwig;K. Kim.
IEEE Circuits & Devices (2004)

538 Citations

Extension and source/drain design for high-performance FinFET devices

J. Kedzierski;Meikei Ieong;E. Nowak;T.S. Kanarsky.
IEEE Transactions on Electron Devices (2003)

372 Citations

Fin FET devices from bulk semiconductor and method for forming

David M Fried;Edward J Nowak;Beth Ann Rainey;Devendra K Sadana.
(2003)

364 Citations

Strained Fin FETs structure and method

William F. Clark;David M. Fried;Louis D. Lanzerotti;Edward J. Nowak.
(2003)

341 Citations

Method for fabricating multiple-plane FinFET CMOS

David M. Fried;Edward J. Nowak.
(2003)

339 Citations

Ultralow-voltage, minimum-energy CMOS

S. Hanson;B. Zhai;K. Bernstein;D. Blaauw.
Ibm Journal of Research and Development (2006)

303 Citations

Multiple-plane FinFET CMOS

David M. Fried;Edward J. Nowak.
(2001)

302 Citations

Finfet layout generation

David M. Fried;William C. Leipold;Edward J. Nowak.
(2002)

290 Citations

If you think any of the details on this page are incorrect, let us know.

Contact us

Best Scientists Citing Edward J. Nowak

Kangguo Cheng

Kangguo Cheng

IBM (United States)

Publications: 229

Ali Khakifirooz

Ali Khakifirooz

Intel (United States)

Publications: 104

Bruce B. Doris

Bruce B. Doris

IBM (United States)

Publications: 98

Alexander Reznicek

Alexander Reznicek

IBM (United States)

Publications: 86

Brian S. Doyle

Brian S. Doyle

Intel (United States)

Publications: 66

Jeffrey W. Sleight

Jeffrey W. Sleight

IBM (United States)

Publications: 54

Robert S. Chau

Robert S. Chau

Intel (United States)

Publications: 51

Chenming Hu

Chenming Hu

University of California, Berkeley

Publications: 51

Josephine B. Chang

Josephine B. Chang

Northrop Grumman (United States)

Publications: 46

Niraj K. Jha

Niraj K. Jha

Princeton University

Publications: 43

Suman Datta

Suman Datta

University of Notre Dame

Publications: 43

Ruilong Xie

Ruilong Xie

IBM (United States)

Publications: 43

Bin Yu

Bin Yu

Southeast University

Publications: 43

Kaushik Roy

Kaushik Roy

Purdue University West Lafayette

Publications: 42

Wilfried Haensch

Wilfried Haensch

IBM (United States)

Publications: 41

Gurtej S. Sandhu

Gurtej S. Sandhu

Micron (United States)

Publications: 38

Trending Scientists

Benyu Zhang

Benyu Zhang

Ant Group

Weidong Zhang

Weidong Zhang

Shanghai Jiao Tong University

Stéphane Golhen

Stéphane Golhen

University of Rennes

Xiaoxiong Zeng

Xiaoxiong Zeng

Nanjing Agricultural University

Hang Sun

Hang Sun

Chinese Academy of Sciences

Cristian Coarfa

Cristian Coarfa

Baylor College of Medicine

Christian Widmann

Christian Widmann

University of Lausanne

Ivan R. Nabi

Ivan R. Nabi

University of British Columbia

Jing Wang

Jing Wang

Chinese Academy of Sciences

David R. Maidment

David R. Maidment

The University of Texas at Austin

Mark Hemer

Mark Hemer

Illinois Tool Works (United States)

Huijuan Dong

Huijuan Dong

Shanghai Jiao Tong University

Monique Esclapez

Monique Esclapez

Aix-Marseille University

Shauna L. Shapiro

Shauna L. Shapiro

Santa Clara University

James B. Weaver

James B. Weaver

Centers for Disease Control and Prevention

Robbert J. de Winter

Robbert J. de Winter

University of Amsterdam

Something went wrong. Please try again later.