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5th IEEE Electron Devices Technology and Manufacturing (EDTM 2021) Conference

5th IEEE Electron Devices Technology and Manufacturing (EDTM 2021) Conference

Chengdu , China

Submission Deadline: Saturday 07 Nov 2020

Conference Dates: Apr 08, 2021 - Apr 11, 2021

Research
Impact Score 0.90

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Ranking & Metrics Impact Score is a novel metric devised to rank conferences based on the number of contributing the best scientists in addition to the h-index estimated from the scientific papers published by the best scientists. See more details on our methodology page.

Research Impact Score: 0.90
Contributing Best Scientists: 81
H5-index:
Papers published by Best Scientists 104
Research Ranking (Electronics and Electrical Engineering) 112
Research Ranking (Materials Science) 52
Research Ranking (Physics) 98

Conference Call for Papers

We cordially invite you to submit ORIGINAL 3-page Camera-Ready papers the 2021 IEEE Electron Devices Technology and Manufacturing (EDTM 2021) Conference for possible presentations. Original papers are sought on any topic within the scope of EDTM 2021, including, but not limited to:

Topics for EDTM 2021

Materials
Process and Tools for Manufacturing
Semiconductor Devices
Memory Technologies
Photonics, Imaging and Display
Power and Energy Devices
Modeling and Simulation
Reliability
Packaging and Heterogeneous Integration
Yield and Manufacturing
Sensor, MEMS, Bio-Electronics
Flexible and Wearable Electronics
Nanotechnologies
Disruptive Technologies - IoT, AI/ML, Neuromorphic & Quantum Computing
Authors should follow the detailed descriptions in the paper template to prepare their manuscripts.

Overview

Top Research Topics at IEEE Electron Devices Technology and Manufacturing Conference?

  • Optoelectronics (43.24%)
  • Transistor (14.47%)
  • Electronic engineering (10.85%)

IEEE Electron Devices Technology and Manufacturing Conference mainly deals with areas of study such as Optoelectronics, Transistor, Electronic engineering, Silicon and Logic gate. Specifically, studies on CMOS are prevalent in the Optoelectronics works discussed. Studies on Electronic engineering discussed in the conference link to the field of Resistive random-access memory.

It explores research in Silicon and the adjacent study of Annealing (metallurgy). The event explores the study of Logic gate to improve our understanding of the broader topic of Electrical engineering.

What are the most cited papers published at the conference?

  • New opportunity of ferroelectric tunnel junction memory with ultrathin HfO 2 -based oxides (16 citations)
  • Assessing device reliability margin in scaled CMOS technologies using ring oscillator circuits (13 citations)
  • Evolution of the GPU Device widely used in AI and Massive Parallel Processing (12 citations)

Research areas of the most cited articles at IEEE Electron Devices Technology and Manufacturing Conference:

The most cited publications mainly tackle studies in Optoelectronics, Electronic engineering, CMOS, Nanotechnology and Silicon. The most cited papers facilitate discussions on Optoelectronics that incorporate concepts from other fields like Perpendicular, Thermoelectric materials and Power density. The published papers are mostly focused on Electronic engineering, specifically Logic gate.

What topics the last edition of the conference is best known for?

  • Electrical engineering
  • Semiconductor
  • Composite material

The previous edition focused in particular on these issues:

The conference covers a variety of subjects, including Optoelectronics, Transistor, Silicon, Electronic engineering and Logic gate. While work presented in it provided substantial information on Optoelectronics, it also covered topics in Layer (electronics), Graphene and Field-effect transistor. Aside from discussions in Field-effect transistor, the event also deals with the subject of Capacitance which intersects with Ferroelectricity disciplines.

The concepts on Transistor presented in the event can also apply to other research fields, including Electronic circuit, Condensed matter physics, Dielectric and Electronics. Research on Silicon addressed in the event frequently intersections with the field of Substrate (electronics). Research in Resistive random-access memory and the interrelating topic of Crossbar switch were among the subjects of interest in the Electronic engineering studies discussed in the conference.

The most cited articles from the last conference are:

  • Hot carrier Degradation in Classical and Emerging Logic and Power Electronic Devices: Rethinking Reliability for Next-Generation Electronics (3 citations)
  • Cryogenic Operation of 3D Flash Memory for New Applications and Bit Cost Scaling with 6-Bit per Cell (HLC) and Beyond (3 citations)
  • On the Critical Role of Ferroelectric Thickness for Negative Capacitance Transistor Optimization (2 citations)

Papers citation over time

A key indicator for each conference is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

Research.com

The top authors publishing at IEEE Electron Devices Technology and Manufacturing Conference (based on the number of publications) are:

  • Ru Huang (12 papers) published 8 papers at the last edition,
  • Yogesh Singh Chauhan (11 papers) published 2 papers at the last edition, 4 less than at the previous edition,
  • Albert Wang (11 papers) published 7 papers at the last edition, 4 more than at the previous edition,
  • He Qian (11 papers) published 6 papers at the last edition, 3 more than at the previous edition,
  • Bin Gao (11 papers) published 6 papers at the last edition, 3 more than at the previous edition.

The overall trend for top authors publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top authors.

Research.com

Only papers with recognized affiliations are considered

The top affiliations publishing at IEEE Electron Devices Technology and Manufacturing Conference (based on the number of publications) are:

  • Tsinghua University (33 papers) published 16 papers at the last edition, 7 more than at the previous edition,
  • Peking University (31 papers) published 20 papers at the last edition, 14 more than at the previous edition,
  • Chinese Academy of Sciences (30 papers) published 25 papers at the last edition,
  • National Institute of Advanced Industrial Science and Technology (29 papers) published 3 papers at the last edition, 2 less than at the previous edition,
  • University of Tokyo (19 papers) published 5 papers at the last edition.

The overall trend for top affiliations publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top affiliations.

Research.com

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions at the conference edition to all articles published within that conference. The best research institutions were selected based on the largest number of articles published during all editions of the conference.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

Research.com

During the most recent 2021 edition, 9.47% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 38.64% were posted by at least one author from the top 10 institutions publishing at the conference. Another 21.82% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 15.91% of all publications and 23.64% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of conferences they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same conference from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the conference in relation to all participants in a given year.

Research.com

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

Research.com

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing at a conference. The index includes the authors publishing at the last edition of a conference, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

  • Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
  • Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
  • Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
  • Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
  • Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

Research.com

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.

Research.com

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Previous Editions

5th IEEE Electron Devices Technology and Manufacturing (EDTM 2021) Conference

Apr 08, 2021 - Apr 11, 2021

Chengdu , China, China

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