Chengdu , China
Submission Deadline: Saturday 07 Nov 2020
Conference Dates: Apr 08, 2021 - Apr 11, 2021
IEEE Electron Devices Technology and Manufacturing Conference mainly deals with areas of study such as Optoelectronics, Transistor, Electronic engineering, Silicon and Logic gate. Specifically, studies on CMOS are prevalent in the Optoelectronics works discussed. Studies on Electronic engineering discussed in the conference link to the field of Resistive random-access memory.
It explores research in Silicon and the adjacent study of Annealing (metallurgy). The event explores the study of Logic gate to improve our understanding of the broader topic of Electrical engineering.
The most cited publications mainly tackle studies in Optoelectronics, Electronic engineering, CMOS, Nanotechnology and Silicon. The most cited papers facilitate discussions on Optoelectronics that incorporate concepts from other fields like Perpendicular, Thermoelectric materials and Power density. The published papers are mostly focused on Electronic engineering, specifically Logic gate.
The conference covers a variety of subjects, including Optoelectronics, Transistor, Silicon, Electronic engineering and Logic gate. While work presented in it provided substantial information on Optoelectronics, it also covered topics in Layer (electronics), Graphene and Field-effect transistor. Aside from discussions in Field-effect transistor, the event also deals with the subject of Capacitance which intersects with Ferroelectricity disciplines.
The concepts on Transistor presented in the event can also apply to other research fields, including Electronic circuit, Condensed matter physics, Dielectric and Electronics. Research on Silicon addressed in the event frequently intersections with the field of Substrate (electronics). Research in Resistive random-access memory and the interrelating topic of Crossbar switch were among the subjects of interest in the Electronic engineering studies discussed in the conference.
A key indicator for each conference is its effectiveness in reaching other researchers with the papers published at that venue.
The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.
The top authors publishing at IEEE Electron Devices Technology and Manufacturing Conference (based on the number of publications) are:
The overall trend for top authors publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top authors.
Only papers with recognized affiliations are considered
The top affiliations publishing at IEEE Electron Devices Technology and Manufacturing Conference (based on the number of publications) are:
The overall trend for top affiliations publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top affiliations.
The publication chance index shows the ratio of articles published by the best research institutions at the conference edition to all articles published within that conference. The best research institutions were selected based on the largest number of articles published during all editions of the conference.
The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.
During the most recent 2021 edition, 9.47% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 38.64% were posted by at least one author from the top 10 institutions publishing at the conference. Another 21.82% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 15.91% of all publications and 23.64% were from other institutions.
A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of conferences they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same conference from year to year.
The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the conference in relation to all participants in a given year.
The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.
Our experience to innovation index was created to show a cross-section of the experience level of authors publishing at a conference. The index includes the authors publishing at the last edition of a conference, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).
The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:
The chart below illustrates experience levels of first authors in cases of publications with multiple authors.
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Deadline: Monday 20 Feb 2023
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Deadline: Tuesday 10 Jan 2023
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Deadline: Tuesday 31 Jan 2023
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Nanjing , China, China
Deadline: Friday 30 Dec 2022
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Zhuhai , China, China
Deadline: Tuesday 20 Dec 2022
Apr 08, 2021 - Apr 11, 2021
Chengdu , China, China
5th IEEE Electron Devices Technology and Manufacturing (EDTM 2021) Conference
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